JPS5743421A - Adjusting method for correction circuit of electron beam exposure device - Google Patents

Adjusting method for correction circuit of electron beam exposure device

Info

Publication number
JPS5743421A
JPS5743421A JP55118643A JP11864380A JPS5743421A JP S5743421 A JPS5743421 A JP S5743421A JP 55118643 A JP55118643 A JP 55118643A JP 11864380 A JP11864380 A JP 11864380A JP S5743421 A JPS5743421 A JP S5743421A
Authority
JP
Japan
Prior art keywords
electron beam
direction width
computer
deflectors
assignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55118643A
Other languages
Japanese (ja)
Other versions
JPS6230689B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Kaoru Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP55118643A priority Critical patent/JPS5743421A/en
Publication of JPS5743421A publication Critical patent/JPS5743421A/en
Publication of JPS6230689B2 publication Critical patent/JPS6230689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable the accurate adjustment of a correction circuit in a short time by measuring the rectangular width of an electron beam section at the time of supplying X-direction width assignment signal and Y-direction width assignment signal of three different types and calculating an correction signal to be applied to electron beam deflecting means with the measured value. CONSTITUTION:X-direction width and Y-direction width assignment signals U1, V1 are initially selected, and are then respectively supplied to deflectors 5X, 5Y. As a consequence, the deflectors 5X, 5Y respectively deflect the electron beam in response to the assignment signals, and the electron beam having a rectangular section is led from the opening of an aperture plate 7. The X-direction width WX and Y-direction width WY of this electron beam are measured to obtain measured values X1, Y1, which are in turn supplied to a computer 11 and are stored in the computer. Then, different two sets of values are sequentially supplied as assignment signals to the deflectors 5X, 5Y, two sets of measured values are thus obtained, and are entirely similarly stored in the computer 11. The computer 11 thus calculates the correction value by the method of least squares and the like from the measured values stored in the computer.
JP55118643A 1980-08-28 1980-08-28 Adjusting method for correction circuit of electron beam exposure device Granted JPS5743421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55118643A JPS5743421A (en) 1980-08-28 1980-08-28 Adjusting method for correction circuit of electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55118643A JPS5743421A (en) 1980-08-28 1980-08-28 Adjusting method for correction circuit of electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5743421A true JPS5743421A (en) 1982-03-11
JPS6230689B2 JPS6230689B2 (en) 1987-07-03

Family

ID=14741618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55118643A Granted JPS5743421A (en) 1980-08-28 1980-08-28 Adjusting method for correction circuit of electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5743421A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7333168B2 (en) 2018-11-19 2023-08-24 デクセリアルズ株式会社 POLARIZING ELEMENT, POLARIZING ELEMENT MANUFACTURING METHOD, AND OPTICAL DEVICE

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5530811A (en) * 1978-08-25 1980-03-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Single field alignment method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5530811A (en) * 1978-08-25 1980-03-04 Chiyou Lsi Gijutsu Kenkyu Kumiai Single field alignment method

Also Published As

Publication number Publication date
JPS6230689B2 (en) 1987-07-03

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