JPS56133829A - Control for beam width - Google Patents

Control for beam width

Info

Publication number
JPS56133829A
JPS56133829A JP3662280A JP3662280A JPS56133829A JP S56133829 A JPS56133829 A JP S56133829A JP 3662280 A JP3662280 A JP 3662280A JP 3662280 A JP3662280 A JP 3662280A JP S56133829 A JPS56133829 A JP S56133829A
Authority
JP
Japan
Prior art keywords
irradiating
current value
electron
electron beam
aimed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3662280A
Other languages
Japanese (ja)
Other versions
JPS5856967B2 (en
Inventor
Hidekazu Goto
Takashi Souma
Masanori Idesawa
Takao Namae
Moriyuki Isobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP3662280A priority Critical patent/JPS5856967B2/en
Publication of JPS56133829A publication Critical patent/JPS56133829A/en
Publication of JPS5856967B2 publication Critical patent/JPS5856967B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Abstract

PURPOSE:To control a beam current with high accuracy by corresponding the current value of irradiating beam width to the value multiplying the ratio of the area of the irradiating beam to that of a reference beam by the current value of the reference beam in irradiating an electron beam in sectional shape by two masks. CONSTITUTION:When the electron beam from an electron gun 1 is aimed at an upper mask 3a and aimed at a lower mask 3b by deflecting the electron beam by an electron beam sectional shape means consisting of deflectors 5a, 5b and a big variable means 6 and aimed the shaped electron beam on a sample, the current value of the irradiating beam is detected by a Faraday cup 12. And the beam current is controlled by proportioning to the beam width by controlling the deflection intensity so that the current value of an irradiation beam may correspond to the value multiplying the ratio of the area of the irradiating beam to that of a reference beam by the current value of the reference beam at each deflection stage. In this way, the intensity of the electron beam will automatically be controlled with high accuracy.
JP3662280A 1980-03-22 1980-03-22 Electron beam exposure method Expired JPS5856967B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3662280A JPS5856967B2 (en) 1980-03-22 1980-03-22 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3662280A JPS5856967B2 (en) 1980-03-22 1980-03-22 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS56133829A true JPS56133829A (en) 1981-10-20
JPS5856967B2 JPS5856967B2 (en) 1983-12-17

Family

ID=12474900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3662280A Expired JPS5856967B2 (en) 1980-03-22 1980-03-22 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5856967B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229818A (en) * 1983-06-13 1984-12-24 Jeol Ltd Charged beam exposure

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6111U (en) * 1984-06-04 1986-01-06 古河電気工業株式会社 Ultrasonic wall thickness measuring device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229818A (en) * 1983-06-13 1984-12-24 Jeol Ltd Charged beam exposure

Also Published As

Publication number Publication date
JPS5856967B2 (en) 1983-12-17

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