JPS5443883A - Metallizing apparatus using electron beam - Google Patents

Metallizing apparatus using electron beam

Info

Publication number
JPS5443883A
JPS5443883A JP11058377A JP11058377A JPS5443883A JP S5443883 A JPS5443883 A JP S5443883A JP 11058377 A JP11058377 A JP 11058377A JP 11058377 A JP11058377 A JP 11058377A JP S5443883 A JPS5443883 A JP S5443883A
Authority
JP
Japan
Prior art keywords
electron beam
electromagnet
evaporated
scanning
max
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11058377A
Other languages
Japanese (ja)
Other versions
JPS6044392B2 (en
Inventor
Masachika Narushima
Kiyoshi Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11058377A priority Critical patent/JPS6044392B2/en
Publication of JPS5443883A publication Critical patent/JPS5443883A/en
Publication of JPS6044392B2 publication Critical patent/JPS6044392B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide a metallizing apparatus using electron beam with large scanning area of electron beam spot and with stable metallizing rate, and is equipped with an electron beam generating source and electromagnets scanning respectively in the direction of X or Y in order to irradiate wide surface range of material to be evaporated. CONSTITUTION:Electron beam 10 generated by a filament 6 is irradiated to the surface center of material 3 to be evaporated to form a circular spot when an electromagnet 7 for scanning in the direction of X and an electromagnet 8 for scanning in the direction of Y are not actuated. Then the current flowing through the electromagnet 7 is made min. at the position b, max. at c, and intermediate at a, at the same time the current flowing through the electromagnet 8 is made max. at the position a, and smaller at b, c than that at a. When current operation is repeated so as to make the current flowing through the electromagnet 8 synchronize with that flowing through the electromagnet 7, electron beam spot 11 shows an ellipse having max. width in the direction of Y at the position a, and small circles at b, c. Continuous change of the currents of the electromagnets 7, 8 makes the electron beam irradiate all around the surface of the material to be evaporated so that the material is heated and evaporated in the predetermined direction.
JP11058377A 1977-09-16 1977-09-16 Electron beam evaporation equipment Expired JPS6044392B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11058377A JPS6044392B2 (en) 1977-09-16 1977-09-16 Electron beam evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11058377A JPS6044392B2 (en) 1977-09-16 1977-09-16 Electron beam evaporation equipment

Publications (2)

Publication Number Publication Date
JPS5443883A true JPS5443883A (en) 1979-04-06
JPS6044392B2 JPS6044392B2 (en) 1985-10-03

Family

ID=14539515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11058377A Expired JPS6044392B2 (en) 1977-09-16 1977-09-16 Electron beam evaporation equipment

Country Status (1)

Country Link
JP (1) JPS6044392B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6098128U (en) * 1983-12-09 1985-07-04 クラリオン株式会社 Tape wrapping prevention device
JPS62207860A (en) * 1986-03-07 1987-09-12 Jeol Ltd Vacuum deposition apparatus
JPH04231458A (en) * 1990-06-29 1992-08-20 Boc Group Inc:The Electron-beam evaporation source

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6098128U (en) * 1983-12-09 1985-07-04 クラリオン株式会社 Tape wrapping prevention device
JPH0416260Y2 (en) * 1983-12-09 1992-04-13
JPS62207860A (en) * 1986-03-07 1987-09-12 Jeol Ltd Vacuum deposition apparatus
JPH0338340B2 (en) * 1986-03-07 1991-06-10 Nippon Electron Optics Lab
JPH04231458A (en) * 1990-06-29 1992-08-20 Boc Group Inc:The Electron-beam evaporation source

Also Published As

Publication number Publication date
JPS6044392B2 (en) 1985-10-03

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