JPS6044392B2 - Electron beam evaporation equipment - Google Patents

Description

[Detailed description of the invention] The present invention relates to an electron beam evaporation apparatus.

An electron beam evaporation apparatus is an apparatus that evaporates the evaporation material by irradiating an electron beam spot onto the surface of the evaporation material, such as aluminum.

A conventional electron beam evaporation apparatus has a structure in which a circular electron beam spot is spread into an ellipse by a permanent magnet, and the surface of the evaporation material is heated with this elliptical electron beam spot. However, in such conventional devices, the container containing the evaporation material, that is, the hearth, is circular, so if the electron beam spot is scanned widely in the short axis direction, it will come into contact with the hearth wall and cause damage to the hearth. May dissolve.

If an attempt is made to prevent this dissolution, the scanning area of the electron beam spot will inevitably become smaller, and as a result, the deposition rate will tend to change, making it impossible to form a deposited film with good reproducibility. SUMMARY OF THE INVENTION It is an object of the present invention to provide an electron beam evaporation apparatus which eliminates such conventional drawbacks, allows a large scanning area of an electron beam spot, and further suppresses changes in evaporation rate. The structure of the present invention for achieving the above object is as follows:
means for scanning a circular beam spot in the X direction;
and means for changing the diameter of the electron beam spot in the Y direction, and is configured to change the electron beam spot diameter in the Y direction when scanning in the X direction and irradiate the vapor deposition material.

Hereinafter, the present invention will be explained in detail with reference to embodiments shown in the drawings.

As shown in FIGS. 1 and 2, this electron beam evaporation apparatus 1 has a block-shaped apparatus main body 2, and J is made of aluminum or the like near one end in the longitudinal direction of the upper surface of this apparatus main body 2. A container for storing the vapor deposition material 3, that is, a hearth 4 is provided, and a hole 5 located near the other end of the upper surface in the longitudinal direction is provided with an electron beam for heating and vaporizing the surface of the vapor deposition material 3 at the lower part of the hole 5. A filament 6 for beam generation is provided.

Then, a permanent magnet 9 and an electromagnet 7 are arranged so as to sandwich the hole 5 or the vapor deposition material 3 in the X direction to constitute an X direction beam control section. Further, the holes 5 are provided on both sides of the electromagnet 7.
A pair of electromagnets 8, 8 are arranged so as to sandwich Y.
It constitutes a directional beam control section. A current device (not shown) supplies the electromagnet 7 with a current having the characteristics shown in FIG. 4, and the electromagnets 8, 8 with a current having the characteristics shown in FIG. .

Next, the scanning state of the electron beam spot 11 produced by the electron beam evaporation apparatus 1 having the above configuration will be explained with reference to FIGS. 2 to 5.

First, as shown in FIG. 2, when the electron beam 10 generated from the filament 6 is operating only the X-direction control section with the reference current, the beam 10 traces an arc as shown in the figure and reaches the evaporation material 3. A circular spot is formed by irradiating the beam at a substantially central location.

Next, as shown in Figure 4, the amount of current flowing through the electromagnet 7 of the X-direction beam control section is the smallest at position b in Figure 3, the largest at position c, and medium at position a. Flow like this. As a result, the electron beam ● spot is scanned on the vapor deposition material 3 in the x direction. At the same time, the amount of current flowing through the electromagnets 8, 8 of the Y-direction beam control section is increased or decreased as shown in FIG. 5, so that the amount of current is the largest at position a in FIG. Make it smaller at position c.

By repeating the current operation of the electromagnets 8, 8 in the Y direction in synchronization with the current operation of the electromagnet 7 in the X direction, the magnetic field applied to the electron beam 10 changes regularly, and as a result, the electron beam 10 changes regularly. The beam ● spot 11 becomes an ellipse with the largest Y diameter at position a in FIG. 3, and becomes a small circle at positions b and c. Note that the figure shows that the beam diameter also becomes slightly larger in the X direction due to beam blurring at position a. Therefore, by continuously changing the amount of current in both the electromagnets 7 and 8 of the X and Y direction beam control sections, the electron beam spot is scanned in the X direction while being scanned in the Y direction. The ellipse diameter is changed, and the electron beam 10 is applied so as to lick the surface of the vapor deposition material 3.
is irradiated, the vapor deposition material 3 is melted by the heat of this spot 11, and evaporates in a predetermined direction, thereby achieving vapor deposition.

As is clear from the above description, according to the present invention, the shape of the electron beam spot irradiated onto the surface of the vapor deposition material is changed while the diameter dimension in the Y direction is changed by the Y direction beam control section. The x-direction beam control section allows scanning in the X-direction.

Therefore, unlike the conventional case where an elliptical electron beam spot with a constant size is used, the electron beam is irradiated so as to lick almost the entire surface of the evaporation material inside the hearth without touching the hearth. be able to. In other words, the scanning area of the electron beam spot is expanded, and as a result, the evaporation material is heated and melted in a uniform and stable state.
The evaporation material can be evaporated in a stable manner, thereby making it possible to form a deposited film with a stable evaporation rate and good reproducibility.

[Brief explanation of the drawing]

FIG. 1 is a plan view of the electron beam evaporation apparatus of the present invention, FIG. 2 is a vertical sectional view taken along line A-N in FIG. 1 in the direction of the arrow,
FIG. 3 is an explanatory enlarged view showing the state of the electron beam spot seen on the surface of the evaporation material, FIG. 4 is a diagram showing changes in the current flowing through the electromagnet 7, and FIG. 5 is a diagram showing changes in the current flowing through the electromagnet 8. It is a figure showing a state. 1... Electron beam evaporation device, 2... Device main body, 3.
... Vapor deposition material, 4... Hearth, 5... Hole, 6...
Filament, 7... Electromagnet of X direction beam control section,
8... Electromagnet of Y direction beam control section, 9... Permanent magnet, 10... Electron beam, 11... Electron beam spot.

Claims (1)

[Claims] 1. A beam generation source that generates an electron beam spot for heating and vaporizing the vapor deposition material in the hearth, and a beam source arranged to sandwich the electron beam in the an X-direction beam control unit that includes a permanent magnet and an electromagnet that scan in the X direction; and a pair of electromagnets that are arranged to sandwich the electron beam in the Y direction and change the beam diameter of the electron beam in the Y direction by changing the supplied current. a Y-direction beam control section consisting of the X,
An electron beam evaporation apparatus characterized in that each beam control section of Y is configured to operate in synchronization with each other.