JPS5357761A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5357761A
JPS5357761A JP13261576A JP13261576A JPS5357761A JP S5357761 A JPS5357761 A JP S5357761A JP 13261576 A JP13261576 A JP 13261576A JP 13261576 A JP13261576 A JP 13261576A JP S5357761 A JPS5357761 A JP S5357761A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
diaphragms
simplify
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13261576A
Other languages
Japanese (ja)
Other versions
JPS5649444B2 (en
Inventor
Kenichi Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13261576A priority Critical patent/JPS5357761A/en
Publication of JPS5357761A publication Critical patent/JPS5357761A/en
Publication of JPS5649444B2 publication Critical patent/JPS5649444B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To simplify the correction of the rotation of electron beams and the position deviation of diaphragms by independently adjusting the positions of two sheets of diaphragms with the electric signal from the outside.
COPYRIGHT: (C)1978,JPO&Japio
JP13261576A 1976-11-04 1976-11-04 Electron beam exposure apparatus Granted JPS5357761A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13261576A JPS5357761A (en) 1976-11-04 1976-11-04 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13261576A JPS5357761A (en) 1976-11-04 1976-11-04 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5357761A true JPS5357761A (en) 1978-05-25
JPS5649444B2 JPS5649444B2 (en) 1981-11-21

Family

ID=15085460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13261576A Granted JPS5357761A (en) 1976-11-04 1976-11-04 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5357761A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6349448U (en) * 1986-09-18 1988-04-04

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52132783A (en) * 1976-04-30 1977-11-07 Jeol Ltd Electron ray exposure unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52132783A (en) * 1976-04-30 1977-11-07 Jeol Ltd Electron ray exposure unit

Also Published As

Publication number Publication date
JPS5649444B2 (en) 1981-11-21

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