JPS5372466A - Exposing unit for electron - Google Patents

Exposing unit for electron

Info

Publication number
JPS5372466A
JPS5372466A JP14763276A JP14763276A JPS5372466A JP S5372466 A JPS5372466 A JP S5372466A JP 14763276 A JP14763276 A JP 14763276A JP 14763276 A JP14763276 A JP 14763276A JP S5372466 A JPS5372466 A JP S5372466A
Authority
JP
Japan
Prior art keywords
electron
exposing unit
revolution
compensating
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14763276A
Other languages
Japanese (ja)
Other versions
JPS5933970B2 (en
Inventor
Kiichi Takamoto
Kaoru Mokuen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP51147632A priority Critical patent/JPS5933970B2/en
Publication of JPS5372466A publication Critical patent/JPS5372466A/en
Publication of JPS5933970B2 publication Critical patent/JPS5933970B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To simplify the electric circuit and to reduce the compensating time, by compensating the component of revolution for the error between the direction of deflection of beam and the mark position with a slight revolution of test piece.
COPYRIGHT: (C)1978,JPO&Japio
JP51147632A 1976-12-10 1976-12-10 Electron beam exposure equipment Expired JPS5933970B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51147632A JPS5933970B2 (en) 1976-12-10 1976-12-10 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51147632A JPS5933970B2 (en) 1976-12-10 1976-12-10 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5372466A true JPS5372466A (en) 1978-06-27
JPS5933970B2 JPS5933970B2 (en) 1984-08-20

Family

ID=15434710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51147632A Expired JPS5933970B2 (en) 1976-12-10 1976-12-10 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5933970B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158924A (en) * 1982-03-16 1983-09-21 Seiko Epson Corp Exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158924A (en) * 1982-03-16 1983-09-21 Seiko Epson Corp Exposure device

Also Published As

Publication number Publication date
JPS5933970B2 (en) 1984-08-20

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