JPS5358773A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS5358773A
JPS5358773A JP13396676A JP13396676A JPS5358773A JP S5358773 A JPS5358773 A JP S5358773A JP 13396676 A JP13396676 A JP 13396676A JP 13396676 A JP13396676 A JP 13396676A JP S5358773 A JPS5358773 A JP S5358773A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
distances
imformation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13396676A
Other languages
Japanese (ja)
Inventor
Hiroshi Yasuda
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13396676A priority Critical patent/JPS5358773A/en
Publication of JPS5358773A publication Critical patent/JPS5358773A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

PURPOSE: Correction according to the moving distances of a stage is made possible by letting the distances between pattern position imformation origins coincide with one period of the outputs of a counter.
COPYRIGHT: (C)1978,JPO&Japio
JP13396676A 1976-11-08 1976-11-08 Electron beam exposure method Pending JPS5358773A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13396676A JPS5358773A (en) 1976-11-08 1976-11-08 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13396676A JPS5358773A (en) 1976-11-08 1976-11-08 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS5358773A true JPS5358773A (en) 1978-05-26

Family

ID=15117235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13396676A Pending JPS5358773A (en) 1976-11-08 1976-11-08 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5358773A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22

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