JPS5760838A - Exposure for electron beam - Google Patents

Exposure for electron beam

Info

Publication number
JPS5760838A
JPS5760838A JP13626180A JP13626180A JPS5760838A JP S5760838 A JPS5760838 A JP S5760838A JP 13626180 A JP13626180 A JP 13626180A JP 13626180 A JP13626180 A JP 13626180A JP S5760838 A JPS5760838 A JP S5760838A
Authority
JP
Japan
Prior art keywords
mark
stage
resist film
correction
scan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13626180A
Other languages
Japanese (ja)
Inventor
Takayuki Miyazaki
Haruo Tsuchikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13626180A priority Critical patent/JPS5760838A/en
Publication of JPS5760838A publication Critical patent/JPS5760838A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To simplify a manufacturing process for photo-masks with high accuracy, by overexposing a resist film, making a mark, detecting the mark position with beam scan, and determining correction f mobile stage deflection. CONSTITUTION:A mask substrate 1 coated with a Cr-film 2 and painted with a resist film 3 is mounted on a stage 20. The stage 20 is moved by a certain amount and exposed with successive beam. Outside a pattern scan region of the resist film 3, a mark 5 of L-shaped concave is formed with overexposure prior to exposure. Coordinates of mark position are obtained for every movement of the stae 20 by detecting electron 31 reflected from scanning beam 30, and are compared with coordinates of the stage 20 position by means of laser measure 21. Correction given to a deflector 16 is calculated and determined with a computer. This makes the mark surface as high as the scan surface and enables highly accurate correction. Particularly, manufacture of photo-masks is simplified, because it is unnecessary to put the mark on the substrate.
JP13626180A 1980-09-30 1980-09-30 Exposure for electron beam Pending JPS5760838A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13626180A JPS5760838A (en) 1980-09-30 1980-09-30 Exposure for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13626180A JPS5760838A (en) 1980-09-30 1980-09-30 Exposure for electron beam

Publications (1)

Publication Number Publication Date
JPS5760838A true JPS5760838A (en) 1982-04-13

Family

ID=15171043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13626180A Pending JPS5760838A (en) 1980-09-30 1980-09-30 Exposure for electron beam

Country Status (1)

Country Link
JP (1) JPS5760838A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210622A (en) * 1982-06-01 1983-12-07 Fujitsu Ltd Electron beam exposing method
JPH04132497U (en) * 1991-05-29 1992-12-08 日本精工株式会社 Water pump device for automobile engine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210622A (en) * 1982-06-01 1983-12-07 Fujitsu Ltd Electron beam exposing method
JPH0336297B2 (en) * 1982-06-01 1991-05-31 Fujitsu Ltd
JPH04132497U (en) * 1991-05-29 1992-12-08 日本精工株式会社 Water pump device for automobile engine

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