JPS5572032A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5572032A
JPS5572032A JP14630578A JP14630578A JPS5572032A JP S5572032 A JPS5572032 A JP S5572032A JP 14630578 A JP14630578 A JP 14630578A JP 14630578 A JP14630578 A JP 14630578A JP S5572032 A JPS5572032 A JP S5572032A
Authority
JP
Japan
Prior art keywords
pulses
mask
pattern
tilting
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14630578A
Other languages
Japanese (ja)
Inventor
Hideo Kusakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14630578A priority Critical patent/JPS5572032A/en
Publication of JPS5572032A publication Critical patent/JPS5572032A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Abstract

PURPOSE:To correct vertical tilting of a pattern through vertical deflection of an electron beam by counting electric pulses corresponding to the substrate vertical movement in synchronization with the horizontal electron beam scanning. CONSTITUTION:Pulses LPUP from laser length meter due to forward movement FWD of the mask M is counted. When the mask is moved a given distance in Y direction, the beam horizontal deflection is synchronized by synchronizing pulses. This synchronization pulse generation causes the pulses LPUP to be counted CTRA, and the circuit DAC-YC to produce a step analog signal, which is amplified AMP to control the Y-axis deflection. This allows the pattern to be corrected from X- axis tilting to the horizontal direction. For more accurate correction, interpolation pulses are given via the counter CTRB to the circuit DAC-YC. To expose the frame F2, the pattern tilting is corrected by the pulses LPDN corresponding to the reverse movement of the mask M and the interporation pulses. This provides a high-accuracy image.
JP14630578A 1978-11-27 1978-11-27 Electron beam exposure device Pending JPS5572032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14630578A JPS5572032A (en) 1978-11-27 1978-11-27 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14630578A JPS5572032A (en) 1978-11-27 1978-11-27 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5572032A true JPS5572032A (en) 1980-05-30

Family

ID=15404665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14630578A Pending JPS5572032A (en) 1978-11-27 1978-11-27 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5572032A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS5891634A (en) * 1981-11-26 1983-05-31 Toshiba Corp Measurement of revolution correction amount of deflection electrode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS631743B2 (en) * 1980-09-17 1988-01-13 Tokyo Shibaura Electric Co
JPS5891634A (en) * 1981-11-26 1983-05-31 Toshiba Corp Measurement of revolution correction amount of deflection electrode

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