JPS553603A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS553603A
JPS553603A JP7411578A JP7411578A JPS553603A JP S553603 A JPS553603 A JP S553603A JP 7411578 A JP7411578 A JP 7411578A JP 7411578 A JP7411578 A JP 7411578A JP S553603 A JPS553603 A JP S553603A
Authority
JP
Japan
Prior art keywords
amplifier
sample stand
reversible counter
converter
summation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7411578A
Other languages
Japanese (ja)
Other versions
JPS6226172B2 (en
Inventor
Kiyomi Koyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7411578A priority Critical patent/JPS553603A/en
Publication of JPS553603A publication Critical patent/JPS553603A/en
Publication of JPS6226172B2 publication Critical patent/JPS6226172B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Abstract

PURPOSE:To improve picture-drawing accuracy as well as throughput by additionally connecting a new calculator and a D-A converter including a reversible counter and an amplifier to a summation amplifier which controls a deflection means of an exposure device for providing a rapid positional correction to a sample stand. CONSTITUTION:Electron beams from an electron gun 11 are deflected by means of a deflection means 10 and applied onto a material 12 to be exposed, which is mounted on a movable sample stand 13. Connected to the deflection means 10 is a summation amplifier 9 which receives a deflection signal from a picture-drawing signal generating integrator 1 through a level adjusting amplifier 2. A presettable reversible counter 6 is also connected to the summation amplifier 9 through a D-A converter 4 and an amplifier 5 to correct the positon of the sample stand 13. There are also provided a length measuring unit 14 and a computor and the outputs of them are applied to the amplifier 9 through the reversible counter 6, D-A converter 7 and amplifier 8 to compersate for the change of the sample stand 13 by use of the positional information read off at the unit 14.
JP7411578A 1978-06-21 1978-06-21 Electron beam exposure device Granted JPS553603A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7411578A JPS553603A (en) 1978-06-21 1978-06-21 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7411578A JPS553603A (en) 1978-06-21 1978-06-21 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS553603A true JPS553603A (en) 1980-01-11
JPS6226172B2 JPS6226172B2 (en) 1987-06-08

Family

ID=13537872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7411578A Granted JPS553603A (en) 1978-06-21 1978-06-21 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS553603A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Also Published As

Publication number Publication date
JPS6226172B2 (en) 1987-06-08

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