JPS53108287A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS53108287A
JPS53108287A JP2215777A JP2215777A JPS53108287A JP S53108287 A JPS53108287 A JP S53108287A JP 2215777 A JP2215777 A JP 2215777A JP 2215777 A JP2215777 A JP 2215777A JP S53108287 A JPS53108287 A JP S53108287A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
manufacture
semiconductor device
substrate
japio
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2215777A
Inventor
Shoji Sato
Yoshihide Sugiura
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To form a reference mark which is sensitive to the electronic beam on the substrate surface with a right-angle pattern included at the area where the chip cut-out region crosses vertically, and thus to carry out the position matching for the substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP2215777A 1977-03-03 1977-03-03 Manufacture of semiconductor device Pending JPS53108287A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2215777A JPS53108287A (en) 1977-03-03 1977-03-03 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2215777A JPS53108287A (en) 1977-03-03 1977-03-03 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS53108287A true true JPS53108287A (en) 1978-09-20

Family

ID=12075000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2215777A Pending JPS53108287A (en) 1977-03-03 1977-03-03 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS53108287A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5795627A (en) * 1980-12-05 1982-06-14 Hitachi Ltd Method for arranging mark in electron beam exposure
JPS57152130A (en) * 1981-03-16 1982-09-20 Nec Corp Semiconductor device
JPS59119832A (en) * 1982-12-27 1984-07-11 Fujitsu Ltd Electron beam exposure
JPS59197726A (en) * 1983-04-25 1984-11-09 Hitachi Zosen Corp Supplying device of heterogeneous fuel in combustion furnace
US4522656A (en) * 1983-07-07 1985-06-11 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Method of making reference surface markings on semiconductor wafers by laser beam
US4534804A (en) * 1984-06-14 1985-08-13 International Business Machines Corporation Laser process for forming identically positioned alignment marks on the opposite sides of a semiconductor wafer
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask
JPH0737946A (en) * 1993-07-22 1995-02-07 Nec Corp Probe device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5795627A (en) * 1980-12-05 1982-06-14 Hitachi Ltd Method for arranging mark in electron beam exposure
JPS57152130A (en) * 1981-03-16 1982-09-20 Nec Corp Semiconductor device
JPS59119832A (en) * 1982-12-27 1984-07-11 Fujitsu Ltd Electron beam exposure
JPS59197726A (en) * 1983-04-25 1984-11-09 Hitachi Zosen Corp Supplying device of heterogeneous fuel in combustion furnace
JPS635646B2 (en) * 1983-04-25 1988-02-04 Hitachi Shipbuilding Eng Co
US4522656A (en) * 1983-07-07 1985-06-11 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Method of making reference surface markings on semiconductor wafers by laser beam
US4534804A (en) * 1984-06-14 1985-08-13 International Business Machines Corporation Laser process for forming identically positioned alignment marks on the opposite sides of a semiconductor wafer
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask
JPH0737946A (en) * 1993-07-22 1995-02-07 Nec Corp Probe device
JP2570585B2 (en) * 1993-07-22 1997-01-08 日本電気株式会社 Probe device

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