JPS5367365A - Correcting method for beam position - Google Patents

Correcting method for beam position

Info

Publication number
JPS5367365A
JPS5367365A JP14213976A JP14213976A JPS5367365A JP S5367365 A JPS5367365 A JP S5367365A JP 14213976 A JP14213976 A JP 14213976A JP 14213976 A JP14213976 A JP 14213976A JP S5367365 A JPS5367365 A JP S5367365A
Authority
JP
Japan
Prior art keywords
beam position
correcting method
chip
reference mark
easing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14213976A
Other languages
Japanese (ja)
Inventor
Akihira Fujinami
Akira Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP14213976A priority Critical patent/JPS5367365A/en
Publication of JPS5367365A publication Critical patent/JPS5367365A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: On a basis of a reference mark close to a chip, the size, distortion and position of each-unit-scanning region is corrected to omit a reference mark inside the chip, thereby easing the restriction as to the pattern designing of an element.
COPYRIGHT: (C)1978,JPO&Japio
JP14213976A 1976-11-29 1976-11-29 Correcting method for beam position Pending JPS5367365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14213976A JPS5367365A (en) 1976-11-29 1976-11-29 Correcting method for beam position

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14213976A JPS5367365A (en) 1976-11-29 1976-11-29 Correcting method for beam position

Publications (1)

Publication Number Publication Date
JPS5367365A true JPS5367365A (en) 1978-06-15

Family

ID=15308262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14213976A Pending JPS5367365A (en) 1976-11-29 1976-11-29 Correcting method for beam position

Country Status (1)

Country Link
JP (1) JPS5367365A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5577144A (en) * 1978-12-07 1980-06-10 Jeol Ltd Electron beam exposure method
JPS5640244A (en) * 1979-09-11 1981-04-16 Mitsubishi Electric Corp Beam scanning correction at electron beam exposure
JPS5721818A (en) * 1980-07-14 1982-02-04 Jeol Ltd Exposure method for electron beam
JPS59188916A (en) * 1983-04-11 1984-10-26 Nippon Telegr & Teleph Corp <Ntt> Correction of deflection distortion
JPS6258621A (en) * 1985-09-09 1987-03-14 Toshiba Corp Fine pattern forming method
JPS6351635A (en) * 1986-08-20 1988-03-04 Yokogawa Hewlett Packard Ltd Lithographic method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494983A (en) * 1972-04-26 1974-01-17
JPS50105381A (en) * 1974-01-28 1975-08-20
JPS5111574A (en) * 1974-06-26 1976-01-29 Ibm

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494983A (en) * 1972-04-26 1974-01-17
JPS50105381A (en) * 1974-01-28 1975-08-20
JPS5111574A (en) * 1974-06-26 1976-01-29 Ibm

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5577144A (en) * 1978-12-07 1980-06-10 Jeol Ltd Electron beam exposure method
JPS5640244A (en) * 1979-09-11 1981-04-16 Mitsubishi Electric Corp Beam scanning correction at electron beam exposure
JPS5721818A (en) * 1980-07-14 1982-02-04 Jeol Ltd Exposure method for electron beam
JPS59188916A (en) * 1983-04-11 1984-10-26 Nippon Telegr & Teleph Corp <Ntt> Correction of deflection distortion
JPH0352211B2 (en) * 1983-04-11 1991-08-09 Nippon Telegraph & Telephone
JPS6258621A (en) * 1985-09-09 1987-03-14 Toshiba Corp Fine pattern forming method
JPS6351635A (en) * 1986-08-20 1988-03-04 Yokogawa Hewlett Packard Ltd Lithographic method

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