JPS56156636A - Mask nega pattern - Google Patents

Mask nega pattern

Info

Publication number
JPS56156636A
JPS56156636A JP5995080A JP5995080A JPS56156636A JP S56156636 A JPS56156636 A JP S56156636A JP 5995080 A JP5995080 A JP 5995080A JP 5995080 A JP5995080 A JP 5995080A JP S56156636 A JPS56156636 A JP S56156636A
Authority
JP
Japan
Prior art keywords
pattern
mask
nega
slit
top angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5995080A
Other languages
Japanese (ja)
Inventor
Yasuhisa Otake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5995080A priority Critical patent/JPS56156636A/en
Publication of JPS56156636A publication Critical patent/JPS56156636A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Abstract

PURPOSE:To eliminate the roundness of the top angle of a slit, by making the top angle of a slit hole mask nega pattern to be acute. CONSTITUTION:The top angle of a rectangular slit hole mask pattern 21 for obtaining a slit type shadow mask hole is made to be acute. A slit hole mask nega pattern where such pattern is arranged as required is used to print a slit hole latent image on a photo-sensitive film. Consequently a slit hole where there is no roundness in the top angle can be formed through the etching resulting in the improvement of the brightness of the picture image.
JP5995080A 1980-05-08 1980-05-08 Mask nega pattern Pending JPS56156636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5995080A JPS56156636A (en) 1980-05-08 1980-05-08 Mask nega pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5995080A JPS56156636A (en) 1980-05-08 1980-05-08 Mask nega pattern

Publications (1)

Publication Number Publication Date
JPS56156636A true JPS56156636A (en) 1981-12-03

Family

ID=13127925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5995080A Pending JPS56156636A (en) 1980-05-08 1980-05-08 Mask nega pattern

Country Status (1)

Country Link
JP (1) JPS56156636A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0286027A (en) * 1988-06-22 1990-03-27 Dainippon Printing Co Ltd Shadow mask forming pattern and manufacture thereof
US5280215A (en) * 1990-11-22 1994-01-18 Kabushiki Kaisha Toshiba Shadow mask for color cathode ray tube
KR100455677B1 (en) * 2001-03-06 2004-11-06 마쯔시다덴기산교 가부시키가이샤 Color picture tube
KR20070054323A (en) * 2005-11-23 2007-05-29 삼성에스디아이 주식회사 Mask for screen printing, screen printing methode thereused, manufacturing methode of organic light emitting display device, and organic light emitting display device
US7459840B2 (en) 2005-04-15 2008-12-02 Samsung Sdi Co., Ltd. Shadow mask for cathode ray tube (CRT)
JP2015521757A (en) * 2012-06-29 2015-07-30 京東方科技集團股▲ふん▼有限公司 mask

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0286027A (en) * 1988-06-22 1990-03-27 Dainippon Printing Co Ltd Shadow mask forming pattern and manufacture thereof
US5280215A (en) * 1990-11-22 1994-01-18 Kabushiki Kaisha Toshiba Shadow mask for color cathode ray tube
US5411822A (en) * 1990-11-22 1995-05-02 Kabushiki Kaisha Toshiba Shadow mask for color cathode ray tube, shadow mask printing negative plate used for manufacture of the shadow mask, and method and manufacturing the negative plate
EP0715331A2 (en) 1990-11-22 1996-06-05 Kabushiki Kaisha Toshiba Negative plate used for manufacture of a shadow mask, and method for manufacturing the negative plate
EP0715331A3 (en) * 1990-11-22 1997-05-28 Toshiba Kk Negative plate used for manufacture of a shadow mask, and method for manufacturing the negative plate
KR100455677B1 (en) * 2001-03-06 2004-11-06 마쯔시다덴기산교 가부시키가이샤 Color picture tube
US7459840B2 (en) 2005-04-15 2008-12-02 Samsung Sdi Co., Ltd. Shadow mask for cathode ray tube (CRT)
KR20070054323A (en) * 2005-11-23 2007-05-29 삼성에스디아이 주식회사 Mask for screen printing, screen printing methode thereused, manufacturing methode of organic light emitting display device, and organic light emitting display device
JP2015521757A (en) * 2012-06-29 2015-07-30 京東方科技集團股▲ふん▼有限公司 mask
US9529252B2 (en) 2012-06-29 2016-12-27 Boe Technology Group Co., Ltd. Mask plate

Similar Documents

Publication Publication Date Title
JPS56156636A (en) Mask nega pattern
JPS57106128A (en) Forming method for pattern
JPS5359367A (en) Formation of electron beam resist image
JPS5220830A (en) Color photographic light sensitive material
JPS53110379A (en) Optical filter and its manufacture
JPS5347266A (en) Color picture tube and its manufacture
JPS5399760A (en) Color picture tube
JPS5314570A (en) Production of photo mask
JPS57132008A (en) Measuring method for pattern size
JPS5555528A (en) Mask aligner
JPS53136969A (en) Photomask
JPS545659A (en) Manufacture of semiconductor device
JPS52150044A (en) Copier
JPS57212445A (en) Production of photomask
JPS52152171A (en) Wafer alignment method
JPS53145477A (en) Electron beam exposure method
JPS53117385A (en) Exposure mask for patterning
JPS57157250A (en) Production for rugged substrate
JPS5264869A (en) Shadow mask type color picture tube
JPS5283064A (en) Regist film forming method
JPS5375852A (en) Manufacture of print acreen
JPS5345165A (en) Formation method of fluorescent screen for color picture tube
JPS544077A (en) Photo mask for far ultraviolet ray exposure
JPS5440080A (en) Forming method of photo resist film
JPS5381071A (en) Origin aligning method