JPS57157250A - Production for rugged substrate - Google Patents

Production for rugged substrate

Info

Publication number
JPS57157250A
JPS57157250A JP4167581A JP4167581A JPS57157250A JP S57157250 A JPS57157250 A JP S57157250A JP 4167581 A JP4167581 A JP 4167581A JP 4167581 A JP4167581 A JP 4167581A JP S57157250 A JPS57157250 A JP S57157250A
Authority
JP
Japan
Prior art keywords
substrate
shadow mask
long
rugged
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4167581A
Other languages
Japanese (ja)
Other versions
JPH037106B2 (en
Inventor
Nobuyuki Tsuda
Masaaki Tamaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4167581A priority Critical patent/JPS57157250A/en
Publication of JPS57157250A publication Critical patent/JPS57157250A/en
Publication of JPH037106B2 publication Critical patent/JPH037106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To produce a rugged substrate having a pattern different that of a shadow mask, by giving aperture patterns having regular pitches of 5-20mu in the vertical direction to the shadow mask and exposing the shadow mask while keeping the interval between a photoresist and the shadow mask in a specific range. CONSTITUTION:A shadow mask 3 which has checkers consisting of square parts (black), through which the light is not transmitted, with one side 2.5-10mu long and light transmitting square parts (white) with one side 2.5-10mu long and has a pattern where aperture pitches are 5-20mu in the vertical direction is held on a negative photoresist 2 on a substrate 1 through a gap 4, 5-80mu long, and they are exposed from the side of the mask 3. Next, they are developed, and the resist 2 in an unexposed part is removed, and the substrate is etched, thus obtaining a rugged substrate having a square height surrounded by white grooves. When a positive photoresist is used, a rugged substrate having a hollow surrounded by banks is obtained. A phosphor or the like can be grown in the hollow.
JP4167581A 1981-03-24 1981-03-24 Production for rugged substrate Granted JPS57157250A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4167581A JPS57157250A (en) 1981-03-24 1981-03-24 Production for rugged substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4167581A JPS57157250A (en) 1981-03-24 1981-03-24 Production for rugged substrate

Publications (2)

Publication Number Publication Date
JPS57157250A true JPS57157250A (en) 1982-09-28
JPH037106B2 JPH037106B2 (en) 1991-01-31

Family

ID=12614982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4167581A Granted JPS57157250A (en) 1981-03-24 1981-03-24 Production for rugged substrate

Country Status (1)

Country Link
JP (1) JPS57157250A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5255867A (en) * 1975-11-04 1977-05-07 Toshiba Corp Exposure method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5255867A (en) * 1975-11-04 1977-05-07 Toshiba Corp Exposure method

Also Published As

Publication number Publication date
JPH037106B2 (en) 1991-01-31

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