JPS5512784A - Location mark for electron beam exposure - Google Patents

Location mark for electron beam exposure

Info

Publication number
JPS5512784A
JPS5512784A JP8622678A JP8622678A JPS5512784A JP S5512784 A JPS5512784 A JP S5512784A JP 8622678 A JP8622678 A JP 8622678A JP 8622678 A JP8622678 A JP 8622678A JP S5512784 A JPS5512784 A JP S5512784A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
location mark
shaped grooves
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8622678A
Other languages
Japanese (ja)
Other versions
JPS6246976B2 (en
Inventor
Hisaaki Aizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP8622678A priority Critical patent/JPS5512784A/en
Publication of JPS5512784A publication Critical patent/JPS5512784A/en
Publication of JPS6246976B2 publication Critical patent/JPS6246976B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain location mark for electron beam exposure by forming at least two or more V-shaped grooves on a silicone base plate, and by controlling the length of the convex flat part between the adjacent V-shaped grooves.
CONSTITUTION: On a silicone base plate 111 with a plane azimuth of (100) are formed two V-shaped grooves formed by anisotropic etching to have a plane azimuth (111) on the wall surface. The length of the convex flat part 151 between the adjacent V-shaped grooves is to be 4.0μm or more to obtain a location mark 112 for electron beam exposure.
COPYRIGHT: (C)1980,JPO&Japio
JP8622678A 1978-07-14 1978-07-14 Location mark for electron beam exposure Granted JPS5512784A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8622678A JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8622678A JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5512784A true JPS5512784A (en) 1980-01-29
JPS6246976B2 JPS6246976B2 (en) 1987-10-06

Family

ID=13880866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8622678A Granted JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5512784A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0078578A2 (en) * 1981-11-02 1983-05-11 Philips Electronics Uk Limited Method of using an electron beam
EP0078579A2 (en) * 1981-11-02 1983-05-11 Philips Electronics Uk Limited Method of using an electron beam
JPS5870554U (en) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 damper pulley
JPS58180022A (en) * 1982-04-14 1983-10-21 Sanyo Electric Co Ltd Positioning method in electron-beam exposure

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI81458C (en) * 1987-03-31 1990-10-10 Inter Marketing Oy Device for identification of coins or the like
JPS63188776U (en) * 1987-05-22 1988-12-05
JPH0289574U (en) * 1988-12-23 1990-07-16

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539475A (en) * 1976-07-12 1978-01-27 Ibm Device for detecting position of electron beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539475A (en) * 1976-07-12 1978-01-27 Ibm Device for detecting position of electron beam

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0078578A2 (en) * 1981-11-02 1983-05-11 Philips Electronics Uk Limited Method of using an electron beam
EP0078579A2 (en) * 1981-11-02 1983-05-11 Philips Electronics Uk Limited Method of using an electron beam
JPS5870554U (en) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 damper pulley
JPS58180022A (en) * 1982-04-14 1983-10-21 Sanyo Electric Co Ltd Positioning method in electron-beam exposure

Also Published As

Publication number Publication date
JPS6246976B2 (en) 1987-10-06

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