JPS5512784A - Location mark for electron beam exposure - Google Patents
Location mark for electron beam exposureInfo
- Publication number
- JPS5512784A JPS5512784A JP8622678A JP8622678A JPS5512784A JP S5512784 A JPS5512784 A JP S5512784A JP 8622678 A JP8622678 A JP 8622678A JP 8622678 A JP8622678 A JP 8622678A JP S5512784 A JPS5512784 A JP S5512784A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam exposure
- location mark
- shaped grooves
- base plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain location mark for electron beam exposure by forming at least two or more V-shaped grooves on a silicone base plate, and by controlling the length of the convex flat part between the adjacent V-shaped grooves.
CONSTITUTION: On a silicone base plate 111 with a plane azimuth of (100) are formed two V-shaped grooves formed by anisotropic etching to have a plane azimuth (111) on the wall surface. The length of the convex flat part 151 between the adjacent V-shaped grooves is to be 4.0μm or more to obtain a location mark 112 for electron beam exposure.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8622678A JPS5512784A (en) | 1978-07-14 | 1978-07-14 | Location mark for electron beam exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8622678A JPS5512784A (en) | 1978-07-14 | 1978-07-14 | Location mark for electron beam exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5512784A true JPS5512784A (en) | 1980-01-29 |
JPS6246976B2 JPS6246976B2 (en) | 1987-10-06 |
Family
ID=13880866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8622678A Granted JPS5512784A (en) | 1978-07-14 | 1978-07-14 | Location mark for electron beam exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5512784A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0078578A2 (en) * | 1981-11-02 | 1983-05-11 | Philips Electronics Uk Limited | Method of using an electron beam |
EP0078579A2 (en) * | 1981-11-02 | 1983-05-11 | Philips Electronics Uk Limited | Method of using an electron beam |
JPS5870554U (en) * | 1981-11-09 | 1983-05-13 | トヨタ自動車株式会社 | damper pulley |
JPS58180022A (en) * | 1982-04-14 | 1983-10-21 | Sanyo Electric Co Ltd | Positioning method in electron-beam exposure |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI81458C (en) * | 1987-03-31 | 1990-10-10 | Inter Marketing Oy | Device for identification of coins or the like |
JPS63188776U (en) * | 1987-05-22 | 1988-12-05 | ||
JPH0289574U (en) * | 1988-12-23 | 1990-07-16 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS539475A (en) * | 1976-07-12 | 1978-01-27 | Ibm | Device for detecting position of electron beam |
-
1978
- 1978-07-14 JP JP8622678A patent/JPS5512784A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS539475A (en) * | 1976-07-12 | 1978-01-27 | Ibm | Device for detecting position of electron beam |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0078578A2 (en) * | 1981-11-02 | 1983-05-11 | Philips Electronics Uk Limited | Method of using an electron beam |
EP0078579A2 (en) * | 1981-11-02 | 1983-05-11 | Philips Electronics Uk Limited | Method of using an electron beam |
JPS5870554U (en) * | 1981-11-09 | 1983-05-13 | トヨタ自動車株式会社 | damper pulley |
JPS58180022A (en) * | 1982-04-14 | 1983-10-21 | Sanyo Electric Co Ltd | Positioning method in electron-beam exposure |
Also Published As
Publication number | Publication date |
---|---|
JPS6246976B2 (en) | 1987-10-06 |
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