JPS647043A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS647043A JPS647043A JP16422587A JP16422587A JPS647043A JP S647043 A JPS647043 A JP S647043A JP 16422587 A JP16422587 A JP 16422587A JP 16422587 A JP16422587 A JP 16422587A JP S647043 A JPS647043 A JP S647043A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- interval
- width
- equal
- variance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To red variance in the size of a formed pattern directly, visually, and accurately by providing a photomask with a fixed-form pattern group which is equal in width and interval and plural pattern groups which are varied in width and interval at a constant rate besides a semiconductor pattern. CONSTITUTION:The fixed-form pattern group 11 which is equal in width and interval and pattern groups 12-14 and 15-17 which are varied in pattern group width and interval are formed. It is assumed that when the pattern groups 11-17 are transferred to a photoresist film on a semiconductor substrate or insulating film on the semiconductor substrate, there is variance in pattern size caused by process variation. At this time, a part where the width and interval of the actual pattern become equal is confirmed by being checked visually through a microscope, etc., and the deviation to the part where the width and interval of the pattern are equal on a mask is measured. Consequently, the variance in pattern size is accurately read.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16422587A JPS647043A (en) | 1987-06-30 | 1987-06-30 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16422587A JPS647043A (en) | 1987-06-30 | 1987-06-30 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS647043A true JPS647043A (en) | 1989-01-11 |
JPH0545948B2 JPH0545948B2 (en) | 1993-07-12 |
Family
ID=15789050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16422587A Granted JPS647043A (en) | 1987-06-30 | 1987-06-30 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS647043A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07153802A (en) * | 1993-11-30 | 1995-06-16 | Nec Corp | Semiconductor device |
US8091658B2 (en) | 2005-12-29 | 2012-01-10 | Industrial Technology Research Institute | Wheel arrangement for a four-wheeled vehicle |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582845A (en) * | 1981-06-30 | 1983-01-08 | Toshiba Corp | Photomask and pattern evaluating method |
JPS5883853A (en) * | 1981-11-13 | 1983-05-19 | Nippon Kogaku Kk <Nikon> | Mask substrate for check |
JPS5960439A (en) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | Photomask |
-
1987
- 1987-06-30 JP JP16422587A patent/JPS647043A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582845A (en) * | 1981-06-30 | 1983-01-08 | Toshiba Corp | Photomask and pattern evaluating method |
JPS5883853A (en) * | 1981-11-13 | 1983-05-19 | Nippon Kogaku Kk <Nikon> | Mask substrate for check |
JPS5960439A (en) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | Photomask |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07153802A (en) * | 1993-11-30 | 1995-06-16 | Nec Corp | Semiconductor device |
US8091658B2 (en) | 2005-12-29 | 2012-01-10 | Industrial Technology Research Institute | Wheel arrangement for a four-wheeled vehicle |
Also Published As
Publication number | Publication date |
---|---|
JPH0545948B2 (en) | 1993-07-12 |
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