JPS57109332A - Formation of pattern - Google Patents

Formation of pattern

Info

Publication number
JPS57109332A
JPS57109332A JP55185797A JP18579780A JPS57109332A JP S57109332 A JPS57109332 A JP S57109332A JP 55185797 A JP55185797 A JP 55185797A JP 18579780 A JP18579780 A JP 18579780A JP S57109332 A JPS57109332 A JP S57109332A
Authority
JP
Japan
Prior art keywords
pattern
ray
ray mask
mask
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55185797A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kawabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55185797A priority Critical patent/JPS57109332A/en
Publication of JPS57109332A publication Critical patent/JPS57109332A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam

Abstract

PURPOSE:To enable to form the prescribed pattern having a high superposing accuracy by a method wherein the measurements of the pattern group of an X- ray mask are relatively reduced from the measurements of the pattern group which will be formed using other method of exposure, and X-ray exposing method and other exposing method are jointly used. CONSTITUTION:When the prescribed pattern is formed on a substrate 5 cojointly using the X-ray exposing method, wherein a divergent X-ray source 1 and an X- ray mask 3 are combined, and other exposing method with the distance between the divergent X-ray source 1 and the X-ray mask 3 set at D and the interval between the X-ray mask 3 and the substrate 5 is set at g, the pattern 4 of the X-ray mask 3 is formed in advance by reducing (1+g/D) times, or in contrast with this, the pattern to be formed using other method of exposure is formed by magnifying (1+g/D) times.
JP55185797A 1980-12-26 1980-12-26 Formation of pattern Pending JPS57109332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55185797A JPS57109332A (en) 1980-12-26 1980-12-26 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55185797A JPS57109332A (en) 1980-12-26 1980-12-26 Formation of pattern

Publications (1)

Publication Number Publication Date
JPS57109332A true JPS57109332A (en) 1982-07-07

Family

ID=16177051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55185797A Pending JPS57109332A (en) 1980-12-26 1980-12-26 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS57109332A (en)

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