JPS5222479A - Method of inspecting masks - Google Patents

Method of inspecting masks

Info

Publication number
JPS5222479A
JPS5222479A JP9875175A JP9875175A JPS5222479A JP S5222479 A JPS5222479 A JP S5222479A JP 9875175 A JP9875175 A JP 9875175A JP 9875175 A JP9875175 A JP 9875175A JP S5222479 A JPS5222479 A JP S5222479A
Authority
JP
Japan
Prior art keywords
inspecting masks
masks
inspecting
inspection
troublesomeness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9875175A
Other languages
Japanese (ja)
Other versions
JPS5521459B2 (en
Inventor
Tsunehiro Naganami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9875175A priority Critical patent/JPS5222479A/en
Publication of JPS5222479A publication Critical patent/JPS5222479A/en
Publication of JPS5521459B2 publication Critical patent/JPS5521459B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To solve the troublesomeness of alignments and to shorten the inspection time by performing the comparison inspection of various types of photo masks being measured with the use of one standard mask.
COPYRIGHT: (C)1977,JPO&Japio
JP9875175A 1975-08-13 1975-08-13 Method of inspecting masks Granted JPS5222479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9875175A JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9875175A JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Publications (2)

Publication Number Publication Date
JPS5222479A true JPS5222479A (en) 1977-02-19
JPS5521459B2 JPS5521459B2 (en) 1980-06-10

Family

ID=14228152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9875175A Granted JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Country Status (1)

Country Link
JP (1) JPS5222479A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108738A (en) * 1979-02-13 1980-08-21 Fujitsu Ltd Inspection for registration of photomask
JPS5680132A (en) * 1979-12-06 1981-07-01 Nec Corp Inspection of mask
US5283205A (en) * 1991-03-19 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108738A (en) * 1979-02-13 1980-08-21 Fujitsu Ltd Inspection for registration of photomask
JPS5680132A (en) * 1979-12-06 1981-07-01 Nec Corp Inspection of mask
JPH0140488B2 (en) * 1979-12-06 1989-08-29 Nippon Electric Co
US5283205A (en) * 1991-03-19 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Also Published As

Publication number Publication date
JPS5521459B2 (en) 1980-06-10

Similar Documents

Publication Publication Date Title
JPS5276088A (en) System for inspecting defects of pattern having directivity
JPS51134558A (en) Measuring unit
JPS51120180A (en) Pattern printing device
JPS5225575A (en) Inspection method of the state of object
JPS5222479A (en) Method of inspecting masks
JPS51140875A (en) An apparatus for arresting foreign matter in liquid
JPS522547A (en) Optical method to measure displacement of plane
JPS51126071A (en) Mask pattern printing method and the equipment
JPS5258179A (en) Apparatus for measuring diameter of hold bored
JPS51147260A (en) Inspecting method of resist pattern
JPS5228872A (en) Method for measuring the size of thin plane
JPS51131002A (en) Car inspection and examination device
JPS5222473A (en) Panel measuring device
JPS51149332A (en) An automatic marking apparatus
JPS5250688A (en) Checking device for defect of oriented pattern
JPS5322376A (en) Inspecting method of semiconductor device
JPS51142349A (en) Standard-setting device of cylinder gauge
JPS5232275A (en) Wafer inspector
JPS5232271A (en) Inspection method and equipment for photomask pattern
JPS5227280A (en) Method to form pinholes
JPS51127789A (en) Measuring apparatus of mean concentration
JPS53146698A (en) Printed matter inspecting apparatus
JPS5211978A (en) Method and equipment of measuring organic halogen
JPS51117063A (en) Liquid surface level detector of electro-magnetic type
JPS5231760A (en) Method of detecting decreased thickness of glass bulbs for braun tubes