JPS6411399A - Etching of thin film pattern - Google Patents
Etching of thin film patternInfo
- Publication number
- JPS6411399A JPS6411399A JP16663987A JP16663987A JPS6411399A JP S6411399 A JPS6411399 A JP S6411399A JP 16663987 A JP16663987 A JP 16663987A JP 16663987 A JP16663987 A JP 16663987A JP S6411399 A JPS6411399 A JP S6411399A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- layer
- thin film
- etching
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To perform rapid and effective etching at a position of etching under a fine pattern, to improve its yield, to improve the pattern accuracy and to manufacture a thin film etching substrate having high reliability by forming a connecting pattern for connecting an opening pattern to the fine pattern on a resist film. CONSTITUTION:A first layer thin film 12 is formed on a substrate 11, a second layer thin film 13 is formed thereon, and a resist film 14 is formed. When a pattern is formed on the film 14, an opening pattern 15 and a fine pattern 16 are formed, and a connecting pattern 17 for connecting the openings is formed. Then, the second layer thin film layer 13 of the patterns 15, 16, 17 not covered with the film 14 is etched, and then the layer 13 is etched. In this case, an etchant is introduced to the pattern 17 and rapidly fed into the pattern 16. Thus, since it can prevent the etchant from staying in the pattern 16 to accelerate the flowing, the depthwise etching from the layer 13 to the layer 12 is effectively and rapidly performed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16663987A JPS6411399A (en) | 1987-07-03 | 1987-07-03 | Etching of thin film pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16663987A JPS6411399A (en) | 1987-07-03 | 1987-07-03 | Etching of thin film pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6411399A true JPS6411399A (en) | 1989-01-13 |
JPH0552076B2 JPH0552076B2 (en) | 1993-08-04 |
Family
ID=15835006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16663987A Granted JPS6411399A (en) | 1987-07-03 | 1987-07-03 | Etching of thin film pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6411399A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006138268A (en) * | 2004-11-12 | 2006-06-01 | Fujitsu General Ltd | Centrifugal fan device |
JP2007247957A (en) * | 2006-03-15 | 2007-09-27 | Max Co Ltd | Air blowing device |
-
1987
- 1987-07-03 JP JP16663987A patent/JPS6411399A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006138268A (en) * | 2004-11-12 | 2006-06-01 | Fujitsu General Ltd | Centrifugal fan device |
JP2007247957A (en) * | 2006-03-15 | 2007-09-27 | Max Co Ltd | Air blowing device |
Also Published As
Publication number | Publication date |
---|---|
JPH0552076B2 (en) | 1993-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |