JPS6462491A - Formation of metallic pattern - Google Patents

Formation of metallic pattern

Info

Publication number
JPS6462491A
JPS6462491A JP21710787A JP21710787A JPS6462491A JP S6462491 A JPS6462491 A JP S6462491A JP 21710787 A JP21710787 A JP 21710787A JP 21710787 A JP21710787 A JP 21710787A JP S6462491 A JPS6462491 A JP S6462491A
Authority
JP
Japan
Prior art keywords
film
pattern
metallic
resist
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21710787A
Other languages
Japanese (ja)
Inventor
Masaru Sugimoto
Masaaki Matsuzaka
Masami Nagashima
Shuzo Hattori
Etsuyuki Uchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NSK Ltd
Original Assignee
NSK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NSK Ltd filed Critical NSK Ltd
Priority to JP21710787A priority Critical patent/JPS6462491A/en
Publication of JPS6462491A publication Critical patent/JPS6462491A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To exactly form a fine rugged pattern by coating a substrate surface with a nonmetallic protective film, then forming a resist pattern thereon in tight contact therewith. CONSTITUTION:A 1st resist film 13 having low exposing sensitivity is formed on the substrate 10 and a 2nd resist film 14 having high exposing sensitivity and good adhesiveness to the film 13 is formed thereon; following which a photoresist pattern 15 is formed only on the film 14 by a conventional method using a mask having the prescribed pattern. A metallic coating 17 is then formed thereon by a plating method and the outside surface 17A thereof is corrected to a smooth surface and is adhered to a base plate member 18; thereafter, the substrate 10 formed with the resist pattern 15 consisting of the film 13 and the film 14 is stripped from the metallic film 17 to form the metallic pattern 19 reverse from the resist pattern 15. The infiltration of the plating liquid to the boundary faces between the films 13 and 14 is thereby prohibited in the above-mentioned plating stage. The very small rugged pattern which is entirely free from collapsion in shape is thus extremely exactly formed on the metallic surface.
JP21710787A 1987-08-31 1987-08-31 Formation of metallic pattern Pending JPS6462491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21710787A JPS6462491A (en) 1987-08-31 1987-08-31 Formation of metallic pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21710787A JPS6462491A (en) 1987-08-31 1987-08-31 Formation of metallic pattern

Publications (1)

Publication Number Publication Date
JPS6462491A true JPS6462491A (en) 1989-03-08

Family

ID=16698957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21710787A Pending JPS6462491A (en) 1987-08-31 1987-08-31 Formation of metallic pattern

Country Status (1)

Country Link
JP (1) JPS6462491A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015096235A (en) * 2015-01-28 2015-05-21 田中貴金属工業株式会社 Mesh for nebulizer and method for manufacturing the same
US9700685B2 (en) 2013-01-24 2017-07-11 Tanaka Kikinzoku Kogyo K.K. Nebulizer mesh and production method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9700685B2 (en) 2013-01-24 2017-07-11 Tanaka Kikinzoku Kogyo K.K. Nebulizer mesh and production method thereof
US9889261B2 (en) 2013-01-24 2018-02-13 Tanaka Kikinzoku Kogyo K.K. Nebulizer mesh and production method thereof
JP2015096235A (en) * 2015-01-28 2015-05-21 田中貴金属工業株式会社 Mesh for nebulizer and method for manufacturing the same

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