JPS56155551A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS56155551A JPS56155551A JP5817780A JP5817780A JPS56155551A JP S56155551 A JPS56155551 A JP S56155551A JP 5817780 A JP5817780 A JP 5817780A JP 5817780 A JP5817780 A JP 5817780A JP S56155551 A JPS56155551 A JP S56155551A
- Authority
- JP
- Japan
- Prior art keywords
- openings
- semiconductor device
- constitution
- reliability
- yield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To enable to transcribe the pattern of the whole openings in the most suitable condition, and to contrive to enhance yield and the reliability of the semiconductor device by accurate transcription by a method wherein the size and the form of the openings in an insulating film are made wholley to the same. CONSTITUTION:The opening pattersn 21, 22 of the same size and form are provided on a mask, and the patterns 25, 26 are transcribed on a substrate. By this constitution, protruding of the openings from wirings 23, 24 is avoided, and the reliability and yield can be enhanced as compared with the conventional method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5817780A JPS56155551A (en) | 1980-05-01 | 1980-05-01 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5817780A JPS56155551A (en) | 1980-05-01 | 1980-05-01 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56155551A true JPS56155551A (en) | 1981-12-01 |
Family
ID=13076713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5817780A Pending JPS56155551A (en) | 1980-05-01 | 1980-05-01 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56155551A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60194542A (en) * | 1984-03-16 | 1985-10-03 | Rohm Co Ltd | Forming method of pattern for inter-layer insulating film |
JPS60234212A (en) * | 1984-05-07 | 1985-11-20 | Sony Corp | Etching method |
US7249293B2 (en) | 2001-04-17 | 2007-07-24 | Fujitsu Limited | Method and device for testing for the occurrence of bit errors |
-
1980
- 1980-05-01 JP JP5817780A patent/JPS56155551A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60194542A (en) * | 1984-03-16 | 1985-10-03 | Rohm Co Ltd | Forming method of pattern for inter-layer insulating film |
JPS60234212A (en) * | 1984-05-07 | 1985-11-20 | Sony Corp | Etching method |
US7249293B2 (en) | 2001-04-17 | 2007-07-24 | Fujitsu Limited | Method and device for testing for the occurrence of bit errors |
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