JPS5335475A - Production of semiconductor unit - Google Patents
Production of semiconductor unitInfo
- Publication number
- JPS5335475A JPS5335475A JP11030076A JP11030076A JPS5335475A JP S5335475 A JPS5335475 A JP S5335475A JP 11030076 A JP11030076 A JP 11030076A JP 11030076 A JP11030076 A JP 11030076A JP S5335475 A JPS5335475 A JP S5335475A
- Authority
- JP
- Japan
- Prior art keywords
- production
- film
- semiconductor unit
- positive
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: After a negative photosensitive resin film or a high-polymer film and an Al film are formed on a positive photosensitive resin film which is applied on a semiconductor substrate, the positive resin is subjected to patterning to reduce the side each of the positive resin, thereby obtaining a minute metallic wiring with a good yield.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11030076A JPS5335475A (en) | 1976-09-14 | 1976-09-14 | Production of semiconductor unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11030076A JPS5335475A (en) | 1976-09-14 | 1976-09-14 | Production of semiconductor unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5335475A true JPS5335475A (en) | 1978-04-01 |
Family
ID=14532194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11030076A Pending JPS5335475A (en) | 1976-09-14 | 1976-09-14 | Production of semiconductor unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5335475A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS574127A (en) * | 1980-06-10 | 1982-01-09 | Fujitsu Ltd | Formation of conductor pattern |
US5049972A (en) * | 1988-01-29 | 1991-09-17 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
US5223454A (en) * | 1988-01-29 | 1993-06-29 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
US5854097A (en) * | 1989-09-09 | 1998-12-29 | Canon Kabushiki Kaisha | Method of manufacturing a semiconductor device |
-
1976
- 1976-09-14 JP JP11030076A patent/JPS5335475A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS574127A (en) * | 1980-06-10 | 1982-01-09 | Fujitsu Ltd | Formation of conductor pattern |
US5049972A (en) * | 1988-01-29 | 1991-09-17 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
US5223454A (en) * | 1988-01-29 | 1993-06-29 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
US5854097A (en) * | 1989-09-09 | 1998-12-29 | Canon Kabushiki Kaisha | Method of manufacturing a semiconductor device |
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