JPS5282074A - Production of sis structure - Google Patents

Production of sis structure

Info

Publication number
JPS5282074A
JPS5282074A JP6420576A JP6420576A JPS5282074A JP S5282074 A JPS5282074 A JP S5282074A JP 6420576 A JP6420576 A JP 6420576A JP 6420576 A JP6420576 A JP 6420576A JP S5282074 A JPS5282074 A JP S5282074A
Authority
JP
Japan
Prior art keywords
production
sis structure
sis
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6420576A
Other languages
Japanese (ja)
Other versions
JPS5838930B2 (en
Inventor
Hiroshi Harigai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP51064205A priority Critical patent/JPS5838930B2/en
Publication of JPS5282074A publication Critical patent/JPS5282074A/en
Publication of JPS5838930B2 publication Critical patent/JPS5838930B2/en
Expired legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Weting (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE: To produce an SIS structure by laminating a thin epitaxial layer, an insulating film and a poly Si layer on an Si single crystal substrate and separating these from the substrate by electrolytic etching.
COPYRIGHT: (C)1977,JPO&Japio
JP51064205A 1976-06-02 1976-06-02 Manufacturing method of SIS structure Expired JPS5838930B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51064205A JPS5838930B2 (en) 1976-06-02 1976-06-02 Manufacturing method of SIS structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51064205A JPS5838930B2 (en) 1976-06-02 1976-06-02 Manufacturing method of SIS structure

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP50156763A Division JPS5280776A (en) 1975-12-27 1975-12-27 Preparation of thin film silicon single crystal plate

Publications (2)

Publication Number Publication Date
JPS5282074A true JPS5282074A (en) 1977-07-08
JPS5838930B2 JPS5838930B2 (en) 1983-08-26

Family

ID=13251327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51064205A Expired JPS5838930B2 (en) 1976-06-02 1976-06-02 Manufacturing method of SIS structure

Country Status (1)

Country Link
JP (1) JPS5838930B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5841516U (en) * 1981-09-10 1983-03-18 住友ゴム工業株式会社 Car body grounding member

Also Published As

Publication number Publication date
JPS5838930B2 (en) 1983-08-26

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