JPS5680130A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5680130A
JPS5680130A JP15686179A JP15686179A JPS5680130A JP S5680130 A JPS5680130 A JP S5680130A JP 15686179 A JP15686179 A JP 15686179A JP 15686179 A JP15686179 A JP 15686179A JP S5680130 A JPS5680130 A JP S5680130A
Authority
JP
Japan
Prior art keywords
layer
mask
wiring
pattern
reflection reducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15686179A
Other languages
Japanese (ja)
Inventor
Yoshihide Nagakubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15686179A priority Critical patent/JPS5680130A/en
Publication of JPS5680130A publication Critical patent/JPS5680130A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

PURPOSE:To facilitate the manufacturing of a minute wiring pattern by forming a refelection reducing layer on an Al layer surface for photoetching in consisting the Al layer provided on a semiconductor substrate surface as an electrode and a wiring for patterning. CONSTITUTION:An opening for electrode formation is formed at an oxide film 32 provided on a semiconductor substrate 31. After evaporating an Al layer on the whole surface, a reflection reducing layer 39 (a plasma nitriding thin film or the like is suitable), and a positive resist are successively formed on the Al layer surface to form a mask 35 by applying exposure and developing. Next, the removal by etching is selectively applied to the reflection reducing layer and the Al layer by using the mask 35. Then, the resist mask 35 and the reflection reducing layer 39 are removed to form an Al pattern 34. In exposing the light, unnecessary exposure by reflected light will not be done by the above procedures. Therefore, the minute pattern manufacturing will be facilitated by preventing the formation of an imperfect region in the resist mask generating wedge-shaped notches on a wiring layer.
JP15686179A 1979-12-05 1979-12-05 Manufacture of semiconductor device Pending JPS5680130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15686179A JPS5680130A (en) 1979-12-05 1979-12-05 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15686179A JPS5680130A (en) 1979-12-05 1979-12-05 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5680130A true JPS5680130A (en) 1981-07-01

Family

ID=15636981

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15686179A Pending JPS5680130A (en) 1979-12-05 1979-12-05 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5680130A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846635A (en) * 1981-09-14 1983-03-18 Toshiba Corp Formation of semiconductor element pattern
JPS5933827A (en) * 1982-08-19 1984-02-23 Toshiba Corp Manufacture of semiconductor device
JPS59175772A (en) * 1983-03-26 1984-10-04 Fujitsu Ltd Manufacture of semiconductor device
JPH02275171A (en) * 1989-04-17 1990-11-09 Aisin Aw Co Ltd Lubrication device of one-way clutch of automatic transmission

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (en) * 1972-05-10 1974-01-24
JPS4931282A (en) * 1972-07-21 1974-03-20
JPS5010615A (en) * 1973-05-28 1975-02-03
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd HANDOTAISOCHINOSEIZOHOHO

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (en) * 1972-05-10 1974-01-24
JPS4931282A (en) * 1972-07-21 1974-03-20
JPS5010615A (en) * 1973-05-28 1975-02-03
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd HANDOTAISOCHINOSEIZOHOHO

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846635A (en) * 1981-09-14 1983-03-18 Toshiba Corp Formation of semiconductor element pattern
JPS5933827A (en) * 1982-08-19 1984-02-23 Toshiba Corp Manufacture of semiconductor device
JPS59175772A (en) * 1983-03-26 1984-10-04 Fujitsu Ltd Manufacture of semiconductor device
JPH057857B2 (en) * 1983-03-26 1993-01-29 Fujitsu Ltd
JPH02275171A (en) * 1989-04-17 1990-11-09 Aisin Aw Co Ltd Lubrication device of one-way clutch of automatic transmission

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