JPS576848A - Photomask and its preparation - Google Patents

Photomask and its preparation

Info

Publication number
JPS576848A
JPS576848A JP8059780A JP8059780A JPS576848A JP S576848 A JPS576848 A JP S576848A JP 8059780 A JP8059780 A JP 8059780A JP 8059780 A JP8059780 A JP 8059780A JP S576848 A JPS576848 A JP S576848A
Authority
JP
Japan
Prior art keywords
film
resist pattern
polycrystalline silicon
pattern
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8059780A
Other languages
Japanese (ja)
Other versions
JPS6223861B2 (en
Inventor
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8059780A priority Critical patent/JPS576848A/en
Publication of JPS576848A publication Critical patent/JPS576848A/en
Publication of JPS6223861B2 publication Critical patent/JPS6223861B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To reduce diffracted light at the end of a light shielded part and slantly incident light and to obtain a photomask capable of forming micropatterns faithful to the mask, by providing a transparent end part like a convex lens in the vicinity of the light shielding part. CONSTITUTION:A polycrystalline silicon film 12, a silicon dioxide film 13, an antioxidative insulating film, such as a silicon nitride film 14, are formed on a quartz glass substrate 11. A given resist pattern 15' is formed on the film 14 by the electron beam lithography, the film 14 is etched using this resist pattern 15' to form a given pattern 14', and after the film 13 of the other part has been disclosed, the resist pattern 15' is removed. Then, a polycrystalline silicon film 12 corresponding to said disclosed part is converted into a silicon dioxide film 16 having a transparent end part like a convex lens by treating the film 12 with high temperature steam using the pattern 14' as a mask, thus permitting a photomask 17 having the remaining polycrystalline silicon film 12 as a light shielding part to be obtained.
JP8059780A 1980-06-13 1980-06-13 Photomask and its preparation Granted JPS576848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8059780A JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Publications (2)

Publication Number Publication Date
JPS576848A true JPS576848A (en) 1982-01-13
JPS6223861B2 JPS6223861B2 (en) 1987-05-26

Family

ID=13722732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8059780A Granted JPS576848A (en) 1980-06-13 1980-06-13 Photomask and its preparation

Country Status (1)

Country Link
JP (1) JPS576848A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173744A (en) * 1982-04-05 1983-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Mask
JPS5979254A (en) * 1982-09-27 1984-05-08 ウエスターン　エレクトリック　カムパニー，インコーポレーテツド Photomask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168654A (en) * 1980-05-30 1981-12-24 Fujitsu Ltd Photomask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168654A (en) * 1980-05-30 1981-12-24 Fujitsu Ltd Photomask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173744A (en) * 1982-04-05 1983-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Mask
JPS6259296B2 (en) * 1982-04-05 1987-12-10 Intaanashonaru Bijinesu Mashiinzu Corp
JPS5979254A (en) * 1982-09-27 1984-05-08 ウエスターン　エレクトリック　カムパニー，インコーポレーテツド Photomask

Also Published As

Publication number Publication date
JPS6223861B2 (en) 1987-05-26

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