JPS5734506A - Production of color filter - Google Patents

Production of color filter

Info

Publication number
JPS5734506A
JPS5734506A JP10883980A JP10883980A JPS5734506A JP S5734506 A JPS5734506 A JP S5734506A JP 10883980 A JP10883980 A JP 10883980A JP 10883980 A JP10883980 A JP 10883980A JP S5734506 A JPS5734506 A JP S5734506A
Authority
JP
Japan
Prior art keywords
pattern
layer
vapor deposited
color filter
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10883980A
Other languages
Japanese (ja)
Other versions
JPS6326363B2 (en
Inventor
Hiroyuki Imataki
Yoshiaki Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10883980A priority Critical patent/JPS5734506A/en
Publication of JPS5734506A publication Critical patent/JPS5734506A/en
Publication of JPS6326363B2 publication Critical patent/JPS6326363B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters

Abstract

PURPOSE:To produce a color filter without causing damages on a vapor deposited dye layer by forming a mask pattern on said layer by using a chalcogen glass layer formed on this layer then selectively removing the colored layer. CONSTITUTION:A vapor deposited colored layer 2 is formed on a substrate 1 and a chalcogen glass layer 3 is formed thereon. Pattern exposure 7 is then made thereon through an original pattern 4, after which the chalcogen glass layer in the exposed part is etched off, whereby a master pattern 5 is formed. Thence, the vapor deposited colored layer not covered with the mask pattern 5 is removed with a prescribed etching process, whereby color elements 6 are formed. Thence, the treatment for removing the pattern 5 is carried out. If an uncolored, transparent or extremely pale pattern is used for this mask pattern 5, there is no particular need for this treatment process.
JP10883980A 1980-08-08 1980-08-08 Production of color filter Granted JPS5734506A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10883980A JPS5734506A (en) 1980-08-08 1980-08-08 Production of color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10883980A JPS5734506A (en) 1980-08-08 1980-08-08 Production of color filter

Publications (2)

Publication Number Publication Date
JPS5734506A true JPS5734506A (en) 1982-02-24
JPS6326363B2 JPS6326363B2 (en) 1988-05-30

Family

ID=14494871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10883980A Granted JPS5734506A (en) 1980-08-08 1980-08-08 Production of color filter

Country Status (1)

Country Link
JP (1) JPS5734506A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262072A (en) * 1984-06-08 1985-12-25 Internatl Rectifier Corp Japan Ltd Characteristic measurement for semiconductor device
JP2002305295A (en) * 2001-04-05 2002-10-18 Sony Corp Color solid-state imaging element and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262072A (en) * 1984-06-08 1985-12-25 Internatl Rectifier Corp Japan Ltd Characteristic measurement for semiconductor device
JP2002305295A (en) * 2001-04-05 2002-10-18 Sony Corp Color solid-state imaging element and method of manufacturing the same

Also Published As

Publication number Publication date
JPS6326363B2 (en) 1988-05-30

Similar Documents

Publication Publication Date Title
JPS5716407A (en) Manufacture for stripe filter
JPS57190912A (en) Production of color filter
DE69515571T2 (en) Process for producing a glass substrate coated with a finely structured Nesa glass membrane
JPS574012A (en) Production of color filter
JPS5734506A (en) Production of color filter
JPS57148706A (en) Production of color filter
JPS5734522A (en) Production of electrode substrate for liquid crystal display element
JPS5461931A (en) Forming method of photo resist patterns
JPS57100428A (en) Method for photomechanical process
JPS5557233A (en) Method for manufacturing fluorescent screen
JPS55128832A (en) Method of making minute pattern
JPS5727212A (en) Manufacture of color filter
JPS5779905A (en) Color filter and its production
JPS57118641A (en) Lifting-off method
JPS5574544A (en) Photo mask correcting method
JPS53110379A (en) Optical filter and its manufacture
JPS6447025A (en) Etching
JPS5689741A (en) Dryplate for photomasking
JPS5588057A (en) Production of photo mask
JPS5543542A (en) Exposure method and exposure mask used for this
JPS6425124A (en) Production of color filter
JPS647004A (en) Production of color filter
JPS6472163A (en) Formation of thin film pattern
JPS57104106A (en) Production of optical circuit
JPS5785056A (en) Preparation of metallic substrate