JPS6447025A - Etching - Google Patents
EtchingInfo
- Publication number
- JPS6447025A JPS6447025A JP20449587A JP20449587A JPS6447025A JP S6447025 A JPS6447025 A JP S6447025A JP 20449587 A JP20449587 A JP 20449587A JP 20449587 A JP20449587 A JP 20449587A JP S6447025 A JPS6447025 A JP S6447025A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- patterned
- layers
- resist
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To prevent an upper resist layer from being peeled at the time of developing of a lower resist layer by a method wherein the lower and upper resist layers are formed on a layer to be etched and after the upper resist layer is patterned, a substrate is heated and the lower resist layer is patterned. CONSTITUTION:An Al layer 2, which is used as a layer to be etched, is formed on a substrate 1 and thereafter, lower and upper resist layers 3 and 4 are formed. The layer 4 is patterned with ultraviolet lighted (UV). The layer 3 is exposed with far ultraviolet light (DUV) 5 using the layer 4 as a mask. The substrate 1 is subjected to heating treatment and the layer 3 is developed using the layer 4 as a mask and is patterned. The layer 2 is subjected to dry etching using the double resist layers consisting of the layers 3 and 4 as masks and is patterned and wiring layers 6 are formed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20449587A JPS6447025A (en) | 1987-08-18 | 1987-08-18 | Etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20449587A JPS6447025A (en) | 1987-08-18 | 1987-08-18 | Etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6447025A true JPS6447025A (en) | 1989-02-21 |
Family
ID=16491474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20449587A Pending JPS6447025A (en) | 1987-08-18 | 1987-08-18 | Etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6447025A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0595125A (en) * | 1991-10-01 | 1993-04-16 | Agency Of Ind Science & Technol | Photoelectric conversion element |
US8240914B1 (en) | 1999-09-20 | 2012-08-14 | Maverick Industries, Inc. | Wireless remote cooking thermometer system |
-
1987
- 1987-08-18 JP JP20449587A patent/JPS6447025A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0595125A (en) * | 1991-10-01 | 1993-04-16 | Agency Of Ind Science & Technol | Photoelectric conversion element |
US8240914B1 (en) | 1999-09-20 | 2012-08-14 | Maverick Industries, Inc. | Wireless remote cooking thermometer system |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0095209A3 (en) | Method of forming a resist mask resistant to plasma etching | |
EP0314599A3 (en) | Method of selective reactive ion etching of substrates | |
JPS6447025A (en) | Etching | |
JPS6452142A (en) | Pattern forming process and silylating apparatus | |
JPS6464220A (en) | Forming method for resist pattern | |
JPS57148706A (en) | Production of color filter | |
JPS57100428A (en) | Method for photomechanical process | |
KR930018661A (en) | How to Form Contact Holes | |
JPS57183030A (en) | Manufacture of semiconductor device | |
EP0081977A3 (en) | A maskless process for applying a patterned coating | |
JPS5694353A (en) | Micropattern forming method | |
JPS5541728A (en) | Pattern formation by thick film paste | |
JPS57109331A (en) | Formation of resist pattern | |
JPS6457618A (en) | Pattern forming method | |
JPS5734506A (en) | Production of color filter | |
JPS57211144A (en) | Formation of micropattern | |
JPS6422028A (en) | Forming method for pattern | |
JPS57118641A (en) | Lifting-off method | |
JPS6412547A (en) | Formation of multilayer interconnection | |
JPS6489435A (en) | Dissolution removing method of resist | |
JPS5585027A (en) | Method of fabricating semiconductor device | |
KR890007398A (en) | Pattern Formation Method | |
JPS5637629A (en) | Formation of thin film pattern | |
JPS5578531A (en) | Semiconductor substrate | |
JPS6427228A (en) | Forming method for fine pattern of semiconductor element |