JPS5785056A - Preparation of metallic substrate - Google Patents

Preparation of metallic substrate

Info

Publication number
JPS5785056A
JPS5785056A JP16229980A JP16229980A JPS5785056A JP S5785056 A JPS5785056 A JP S5785056A JP 16229980 A JP16229980 A JP 16229980A JP 16229980 A JP16229980 A JP 16229980A JP S5785056 A JPS5785056 A JP S5785056A
Authority
JP
Japan
Prior art keywords
metallic
film
pinholes
substrate
transparent substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16229980A
Other languages
Japanese (ja)
Inventor
Tadanao Igarashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16229980A priority Critical patent/JPS5785056A/en
Publication of JPS5785056A publication Critical patent/JPS5785056A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To raise yield of a photomask of a metallic substrate, by coating a positive type photoresist film on a transparent substrate coated with a metallic film having pinholes, irradiating the reverse side of the transparent substrate with light, and, after removing the exposed resist film, vapor depositing the second metallic film. CONSTITUTION:To correct a transparent substrate coated with a metallic film having pinholes of the metallic substrate of a photomask or the like for manufacturing integrated circuits, a photoresist film 7 is formed on the whole surface of a metallic pattern 2 having pinholes 3 on the substrate 1. Then, the reverse side is exposed to light 8, the exposed parts 3 of the resist film 7 are removed by development, and the second metallic film 2 is formed by the vapor deposition method or the like. The remaining film 7 and the second metallic film 2 left are removed to obtain the metallic pattern with the pinholes 3 corrected, thus permitting yield of the metallic substrate for a mask or the like to be enhanced.
JP16229980A 1980-11-18 1980-11-18 Preparation of metallic substrate Pending JPS5785056A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16229980A JPS5785056A (en) 1980-11-18 1980-11-18 Preparation of metallic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16229980A JPS5785056A (en) 1980-11-18 1980-11-18 Preparation of metallic substrate

Publications (1)

Publication Number Publication Date
JPS5785056A true JPS5785056A (en) 1982-05-27

Family

ID=15751852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16229980A Pending JPS5785056A (en) 1980-11-18 1980-11-18 Preparation of metallic substrate

Country Status (1)

Country Link
JP (1) JPS5785056A (en)

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