JPS5396674A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5396674A JPS5396674A JP1139477A JP1139477A JPS5396674A JP S5396674 A JPS5396674 A JP S5396674A JP 1139477 A JP1139477 A JP 1139477A JP 1139477 A JP1139477 A JP 1139477A JP S5396674 A JPS5396674 A JP S5396674A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- perform
- simple operation
- photo
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain the photo mask which can perform the size measurement, with a little individual measurement error, through a simple operation.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52011394A JPS5846054B2 (en) | 1977-02-03 | 1977-02-03 | photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52011394A JPS5846054B2 (en) | 1977-02-03 | 1977-02-03 | photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5396674A true JPS5396674A (en) | 1978-08-24 |
JPS5846054B2 JPS5846054B2 (en) | 1983-10-14 |
Family
ID=11776784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52011394A Expired JPS5846054B2 (en) | 1977-02-03 | 1977-02-03 | photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5846054B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5636784U (en) * | 1979-08-24 | 1981-04-08 | ||
JPS5741637A (en) * | 1980-08-26 | 1982-03-08 | Dainippon Printing Co Ltd | Microstep tablet |
JPS582845A (en) * | 1981-06-30 | 1983-01-08 | Toshiba Corp | Photomask and pattern evaluating method |
JPS5821141U (en) * | 1981-08-03 | 1983-02-09 | 沖電気工業株式会社 | mask pattern |
JPS5960439A (en) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | Photomask |
JPS5989352U (en) * | 1982-12-07 | 1984-06-16 | 富士通株式会社 | Photomask for reduction projection exposure |
JPS59105647A (en) * | 1982-12-09 | 1984-06-19 | Mitsubishi Electric Corp | Photomask |
JPS63281439A (en) * | 1987-05-13 | 1988-11-17 | Fujitsu Ltd | Checking method of displacement of baking |
JPH02159011A (en) * | 1988-12-13 | 1990-06-19 | Fujitsu Ltd | Control of pattern size in photolithography |
JP2015191088A (en) * | 2014-03-28 | 2015-11-02 | Hoya株式会社 | Method for manufacturing photomask, photomask, and method for manufacturing display device |
-
1977
- 1977-02-03 JP JP52011394A patent/JPS5846054B2/en not_active Expired
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825034Y2 (en) * | 1979-08-24 | 1983-05-28 | 信 伊藤 | Connection pipe for flush toilet |
JPS5636784U (en) * | 1979-08-24 | 1981-04-08 | ||
JPH0225500B2 (en) * | 1980-08-26 | 1990-06-04 | Dainippon Printing Co Ltd | |
JPS5741637A (en) * | 1980-08-26 | 1982-03-08 | Dainippon Printing Co Ltd | Microstep tablet |
JPS582845A (en) * | 1981-06-30 | 1983-01-08 | Toshiba Corp | Photomask and pattern evaluating method |
JPH0321901B2 (en) * | 1981-06-30 | 1991-03-25 | Tokyo Shibaura Electric Co | |
JPS5821141U (en) * | 1981-08-03 | 1983-02-09 | 沖電気工業株式会社 | mask pattern |
JPS5960439A (en) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | Photomask |
JPH0473576B2 (en) * | 1982-09-30 | 1992-11-24 | ||
JPS634216Y2 (en) * | 1982-12-07 | 1988-02-02 | ||
JPS5989352U (en) * | 1982-12-07 | 1984-06-16 | 富士通株式会社 | Photomask for reduction projection exposure |
JPS6344220B2 (en) * | 1982-12-09 | 1988-09-02 | Mitsubishi Electric Corp | |
JPS59105647A (en) * | 1982-12-09 | 1984-06-19 | Mitsubishi Electric Corp | Photomask |
JPS63281439A (en) * | 1987-05-13 | 1988-11-17 | Fujitsu Ltd | Checking method of displacement of baking |
JPH02159011A (en) * | 1988-12-13 | 1990-06-19 | Fujitsu Ltd | Control of pattern size in photolithography |
JP2015191088A (en) * | 2014-03-28 | 2015-11-02 | Hoya株式会社 | Method for manufacturing photomask, photomask, and method for manufacturing display device |
Also Published As
Publication number | Publication date |
---|---|
JPS5846054B2 (en) | 1983-10-14 |
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