JPS5396674A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5396674A
JPS5396674A JP1139477A JP1139477A JPS5396674A JP S5396674 A JPS5396674 A JP S5396674A JP 1139477 A JP1139477 A JP 1139477A JP 1139477 A JP1139477 A JP 1139477A JP S5396674 A JPS5396674 A JP S5396674A
Authority
JP
Japan
Prior art keywords
photo mask
perform
simple operation
photo
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1139477A
Other languages
Japanese (ja)
Other versions
JPS5846054B2 (en
Inventor
Yasuo Kinoshita
Takashi Itasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP52011394A priority Critical patent/JPS5846054B2/en
Publication of JPS5396674A publication Critical patent/JPS5396674A/en
Publication of JPS5846054B2 publication Critical patent/JPS5846054B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain the photo mask which can perform the size measurement, with a little individual measurement error, through a simple operation.
COPYRIGHT: (C)1978,JPO&Japio
JP52011394A 1977-02-03 1977-02-03 photo mask Expired JPS5846054B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52011394A JPS5846054B2 (en) 1977-02-03 1977-02-03 photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52011394A JPS5846054B2 (en) 1977-02-03 1977-02-03 photo mask

Publications (2)

Publication Number Publication Date
JPS5396674A true JPS5396674A (en) 1978-08-24
JPS5846054B2 JPS5846054B2 (en) 1983-10-14

Family

ID=11776784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52011394A Expired JPS5846054B2 (en) 1977-02-03 1977-02-03 photo mask

Country Status (1)

Country Link
JP (1) JPS5846054B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636784U (en) * 1979-08-24 1981-04-08
JPS5741637A (en) * 1980-08-26 1982-03-08 Dainippon Printing Co Ltd Microstep tablet
JPS582845A (en) * 1981-06-30 1983-01-08 Toshiba Corp Photomask and pattern evaluating method
JPS5821141U (en) * 1981-08-03 1983-02-09 沖電気工業株式会社 mask pattern
JPS5960439A (en) * 1982-09-30 1984-04-06 Fujitsu Ltd Photomask
JPS5989352U (en) * 1982-12-07 1984-06-16 富士通株式会社 Photomask for reduction projection exposure
JPS59105647A (en) * 1982-12-09 1984-06-19 Mitsubishi Electric Corp Photomask
JPS63281439A (en) * 1987-05-13 1988-11-17 Fujitsu Ltd Checking method of displacement of baking
JPH02159011A (en) * 1988-12-13 1990-06-19 Fujitsu Ltd Control of pattern size in photolithography
JP2015191088A (en) * 2014-03-28 2015-11-02 Hoya株式会社 Method for manufacturing photomask, photomask, and method for manufacturing display device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636784U (en) * 1979-08-24 1981-04-08
JPS5741637A (en) * 1980-08-26 1982-03-08 Dainippon Printing Co Ltd Microstep tablet
JPS582845A (en) * 1981-06-30 1983-01-08 Toshiba Corp Photomask and pattern evaluating method
JPS5821141U (en) * 1981-08-03 1983-02-09 沖電気工業株式会社 mask pattern
JPS5960439A (en) * 1982-09-30 1984-04-06 Fujitsu Ltd Photomask
JPS5989352U (en) * 1982-12-07 1984-06-16 富士通株式会社 Photomask for reduction projection exposure
JPS59105647A (en) * 1982-12-09 1984-06-19 Mitsubishi Electric Corp Photomask
JPS63281439A (en) * 1987-05-13 1988-11-17 Fujitsu Ltd Checking method of displacement of baking
JPH02159011A (en) * 1988-12-13 1990-06-19 Fujitsu Ltd Control of pattern size in photolithography
JP2015191088A (en) * 2014-03-28 2015-11-02 Hoya株式会社 Method for manufacturing photomask, photomask, and method for manufacturing display device

Also Published As

Publication number Publication date
JPS5846054B2 (en) 1983-10-14

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