JPS59105647A - Photomask - Google Patents

Abstract

PURPOSE:To grasp accurately quantitatively the accuracy of a photomask produced by an EB exposure device and to make the production of highly accurate photomasks easier, by arranging monitor patterns, with which the accuracy of a normal pattern can be confirmed. CONSTITUTION:After one stripe 5 of a monitor pattern 4A is exposed about four points in a mask surface in accordance with EB data, the part of the monitor pattern 4 is drawn up, and this pattern is successively exposed one stripe by one stripe over the whole mask surface. After this exposure is completed, another monitor pattern 4B is again exposed. When such a method is used, accuracy of the connecting part of stripes, inside stripe, and stripe interface can be checked. A monitor pattern is exposed at the first and last of the exposure and, therefore, the long time drift quantity of a mask pattern can be understood from the displacement of the monitor patterns 4A and 4B.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photomask used in a photolithography process.

[Prior art]

When manufacturing semiconductor devices such as integrated circuits.

Batten formation is generally performed by photolithography technology.

In recent years, as the density of this type of equipment has increased, the quality and accuracy of photomasks such as click accuracy and stacking accuracy have been increasing, and the manufacturing process has become more and more standardized. For this reason, electron beam exposure apparatuses are beginning to be used that allow easy microfabrication, cylindrical precision, and high-speed mask making.

The entire photomask is fabricated by continuously exposing the valley chips with a predetermined scan width on an electron beam exposure device (EB exposure device) according to the KB procedure.

A conventional photomask manufacturing and inspection method will be described below. An example is shown in Figure 1. The raster scan type VB '73' optical device performs raster scanning (3) with a predetermined scan width as shown in the figure.
The photomask fi+the entire surface is exposed to form a pattern (2). Therefore, since one chip of decoupling is divided into a number of stripes and exposed, the joints between the stripes always become a problem within the chip. Also, unlike the conventional photomask production method using the optical power method, the photomask is produced according to the EB data each time, so there is a problem of guaranteeing the impact. Since all photomasks are made in this way, it is essential to inspect the batten joints every time, and this must be ensured for all stripes.

Furthermore, in the conventional method, there was no way to accurately measure the scan width, and it was impossible to determine the scan width.

As mentioned above, in the conventional photomask manufacturing method, the positive 1f
(It was not possible to measure the 1y'x joint part and scan width for each mask.

The drawback was that it was not possible to create a highly accurate photomask.

[Summary of the invention]

This invention was made to eliminate the above-mentioned drawbacks, and aims to provide a photomask that can check the j accuracy of the photomask by arranging all the monitor buttons other than the regular ones. .

[Embodiments of the invention]

Examples will be described below. FIG. 2 is a diagram showing an embodiment of the photomask manufacturing method according to the present invention. 1. According to EB data, monitor button I41 k JM
However, the monitor button (4) is (4A) and (4B)
(4A) is first exposed.

The monitor button + 41id is configured as shown in Fig. 2, and 144 steps are performed using the button that can check the j'l-1 degree of the hanging stripe joint. ) The configuration is such that the same type of baton (4B) k is drawn. 1 stripe of the monitor button (4A) 15) After completing the adjustment to i and l for the 4 locations on the mask surface, apply the monitor button (4A)
After completing the drawing, one stripe of the main button is exposed sequentially using a mask of raw blood as shown in Figure 2. According to F, B Daegu, this button is fully exposed, redundant, and repositioned.

One stripe tel k of the same baton (4B) as that shown above (4A) is exposed.

The gold monitor button +41i- is exposed and the exposure is completed.

By using such a method, it is possible to check all 41 parts of the stripe, and it is also possible to check the accuracy within the stripe and at the stripe interface. Since the monitor button (4) is exposed at the beginning and end of the exposure, the long-term drift 7i of the mask button (4A) and (4B) is reduced by 1'.

In the above embodiment, the monitor buttons (4) are arranged at four locations 11 within the mask, but other arrangements may be used and the same effect will be achieved.

Also, the monitor button (4) is (4A) (4B) 2
Although the method using division and the method using two stripes have been described, similar results can be obtained with other methods. Furthermore, regarding the shape of the button inside the monitor button, the shape of the button shown in the figure will be described.

〔Effect of the invention〕

According to the present invention, the accuracy of the photomask created by the EB exposure device d can be quantitatively grasped by the positive aωl, making it easy to create a photomask with perfect accuracy. In particular, E.B.
w; By checking the monitor button, the accuracy of the scan width and stripe joints, which are problems with optical devices, can be ascertained to a precise level, which is a very effective means of checking the accuracy of the device. . Monitor slam? ! ? The time required for actual drawing exposure is extremely short and there is no problem in drawing and exposing five patterns.

Since the monitor button is located on the 18th side of the photomask, the printing transfer to the wafer has no effect.

Other embodiments will be described. In the above explanation, we have described the 7-oto-mask ('i i method) for KB exposure equipment, but we will explain below about the photomask manufacturing method using the step-and-repeat method.In the step-and-repeat method, as shown in Figure 3, A reticle (6) with a size 10 times that of the reticle is created, and the reticle (6) is reduced to a fan using a reduction lens and step-and-repeat is performed over the entire mask surface.This method also requires the precision of the manufacturing equipment as described above. It was not possible to perform a check on each mask.

In the step-and-repeat method as well, in order to check the accuracy of the manufacturing equipment, a reticle (7) for checking the accuracy is prepared in advance as shown in the diagram and is printed and exposed on the corner of the photomask.

As a self-cylindrical slam on the reticle, even if 1 game h<
tj Place monitor buttons (8) such as check buttons, total pin ff nick buttons, and distortion check buttons on the 4th floor.

In this way, the accuracy of the photomask created by the step-and-repeat method can be determined to be positive (1π1) for each 16 masks, so it is possible to create 7 photomasks with cylindrical accuracy.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing a method for creating an oil B photomask using a conventional EB exposure device and seven otomasks, and FIG. 2 is an explanatory diagram showing a drawing method using an EB exposure device and a photomask according to the present invention. FIG. 8 is an explanatory diagram showing a conventional step-and-repeat method for making a photomask and a photomask;
FIG. 4 is an explanatory diagram showing a step-and-repeat photomask manufacturing method and an odd mask according to the present invention. In the figure, 11) is a photomask, )2) is a regular button, (3) is a raster button, (4) is a monitor button, (4A
) 1, 4B ) is the check button inside the monitor button +
51 fj stripe. Note that the numbers in the middle of the figures indicate the same or 4.('' tooth part. Agent Shin Karasuno - No. 1 ν1 Figure 2 4A 4B Figure 3 Figure 4 Procedural Amendment (Voluntary) Commissioner of the Japan Patent Office 1, Case Display 't,'+1gri1984-2
17177 No. 2, Name of the invention Photomask 3, Person making the amendment Representative: Hitoshi Katayama Department 4, Agent 5 Detailed description of the invention column 61 of the specification subject to amendment IM Correct contents qλ Specification 11) as follows: Correct as shown.

Claims (1)

[Claims] A photomask in which regular tabs are arranged, characterized in that the photomask has, in addition to the regular tabs, a monitor button that can be recognized every inch of the regular tabs.