JPH0258777B2 - - Google Patents

Info

Publication number
JPH0258777B2
JPH0258777B2 JP11277982A JP11277982A JPH0258777B2 JP H0258777 B2 JPH0258777 B2 JP H0258777B2 JP 11277982 A JP11277982 A JP 11277982A JP 11277982 A JP11277982 A JP 11277982A JP H0258777 B2 JPH0258777 B2 JP H0258777B2
Authority
JP
Grant status
Grant
Patent type
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11277982A
Other versions
JPS594019A (en )
Inventor
Eiji Nishikata
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Grant date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
JP11277982A 1982-06-30 1982-06-30 Expired - Lifetime JPH0258777B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11277982A JPH0258777B2 (en) 1982-06-30 1982-06-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11277982A JPH0258777B2 (en) 1982-06-30 1982-06-30

Publications (2)

Publication Number Publication Date
JPS594019A true JPS594019A (en) 1984-01-10
JPH0258777B2 true JPH0258777B2 (en) 1990-12-10

Family

ID=14595279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11277982A Expired - Lifetime JPH0258777B2 (en) 1982-06-30 1982-06-30

Country Status (1)

Country Link
JP (1) JPH0258777B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0172558B1 (en) * 1995-03-22 1999-03-20 김주용 A fabricating method of exposure mask
DE10142316A1 (en) 2001-08-30 2003-04-17 Advanced Micro Devices Inc Semiconductor structure and method for determining critical dimensions and overlay error
DE10224164B4 (en) 2002-05-31 2007-05-10 Advanced Micro Devices, Inc., Sunnyvale A two-dimensional structure for determining an overlay accuracy by means of scattering measurement
US7307712B2 (en) 2002-10-28 2007-12-11 Asml Netherlands B.V. Method of detecting mask defects, a computer program and reference substrate

Also Published As

Publication number Publication date Type
JPS594019A (en) 1984-01-10 application

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