JPS5216979A - Exposure method of photo etching - Google Patents
Exposure method of photo etchingInfo
- Publication number
- JPS5216979A JPS5216979A JP50091973A JP9197375A JPS5216979A JP S5216979 A JPS5216979 A JP S5216979A JP 50091973 A JP50091973 A JP 50091973A JP 9197375 A JP9197375 A JP 9197375A JP S5216979 A JPS5216979 A JP S5216979A
- Authority
- JP
- Japan
- Prior art keywords
- photo etching
- exposure method
- exposure
- photo
- diffraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To remove whisker-type pattern defects due to diffraction, reflection, etc. of light at the time of exposure in the photo etching process of aluminium etc.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50091973A JPS588575B2 (en) | 1975-07-30 | 1975-07-30 | Shashinyotsukokunorokohouhou |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50091973A JPS588575B2 (en) | 1975-07-30 | 1975-07-30 | Shashinyotsukokunorokohouhou |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5216979A true JPS5216979A (en) | 1977-02-08 |
JPS588575B2 JPS588575B2 (en) | 1983-02-16 |
Family
ID=14041460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50091973A Expired JPS588575B2 (en) | 1975-07-30 | 1975-07-30 | Shashinyotsukokunorokohouhou |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS588575B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6158013A (en) * | 1984-08-29 | 1986-03-25 | Hitachi Ltd | Positioning control system |
-
1975
- 1975-07-30 JP JP50091973A patent/JPS588575B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6158013A (en) * | 1984-08-29 | 1986-03-25 | Hitachi Ltd | Positioning control system |
Also Published As
Publication number | Publication date |
---|---|
JPS588575B2 (en) | 1983-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5252579A (en) | Clearance adjusng method | |
JPS51129229A (en) | Method for manufacturing photographic light sensitive materials | |
JPS5225576A (en) | Exposure method of photo-resist | |
JPS5258374A (en) | Improvement in sensitivity of positive type photo resist | |
JPS5216979A (en) | Exposure method of photo etching | |
JPS51124920A (en) | Method for preparing photographic light sensitive materials | |
JPS5230170A (en) | Method of photoetching | |
JPS51111073A (en) | Fine pattern forming | |
JPS5230428A (en) | Photoresist exposure method | |
JPS51115822A (en) | Silver halogenide photo emulsion for ruby laser exposure | |
JPS52143769A (en) | Removing method of positive type photo resist | |
JPS51144253A (en) | Photo-fiber check method | |
JPS52153665A (en) | Etching method of film | |
JPS533821A (en) | Exposure method | |
JPS5380994A (en) | Lift-off method | |
JPS5214369A (en) | Positioning method of the photomask | |
JPS51115821A (en) | Silver halogenide photo emulsion for ruby laser exposure | |
JPS5330799A (en) | Resist exposure | |
JPS51147177A (en) | A treatment method of tantaum oxide | |
JPS5259574A (en) | Production of lead frame for ic | |
JPS51119164A (en) | Method for removing fluorine ions present in water | |
JPS51151071A (en) | Manufacturing method of a semiconductor apparatus | |
JPS52117569A (en) | Electronic beam exposure unit | |
JPS51140482A (en) | Device for printing wafer index | |
JPS5293273A (en) | Fine pattern forming method |