JPS5252579A - Clearance adjusng method - Google Patents

Clearance adjusng method

Info

Publication number
JPS5252579A
JPS5252579A JP50129104A JP12910475A JPS5252579A JP S5252579 A JPS5252579 A JP S5252579A JP 50129104 A JP50129104 A JP 50129104A JP 12910475 A JP12910475 A JP 12910475A JP S5252579 A JPS5252579 A JP S5252579A
Authority
JP
Japan
Prior art keywords
clearance
adjusng
transparent
light
reflectable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50129104A
Other languages
Japanese (ja)
Other versions
JPS579004B2 (en
Inventor
Nobuyoshi Tanaka
Mitsuo Takeda
Kazuya Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP50129104A priority Critical patent/JPS5252579A/en
Publication of JPS5252579A publication Critical patent/JPS5252579A/en
Publication of JPS579004B2 publication Critical patent/JPS579004B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

PURPOSE: To adjust the clearance between a transparent object which reflects light to a certain degree and a reflectable transparent or opaque object by using light without causing surface damaging and eliminate the occurrence of errors which are based on diffraction phenomenon.
COPYRIGHT: (C)1977,JPO&Japio
JP50129104A 1975-10-27 1975-10-27 Clearance adjusng method Granted JPS5252579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50129104A JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50129104A JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Publications (2)

Publication Number Publication Date
JPS5252579A true JPS5252579A (en) 1977-04-27
JPS579004B2 JPS579004B2 (en) 1982-02-19

Family

ID=15001156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50129104A Granted JPS5252579A (en) 1975-10-27 1975-10-27 Clearance adjusng method

Country Status (1)

Country Link
JP (1) JPS5252579A (en)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS56164550U (en) * 1980-05-08 1981-12-07
JPS56164549U (en) * 1980-05-08 1981-12-07
JPS5712743U (en) * 1980-06-23 1982-01-22
JPS5737246U (en) * 1980-08-13 1982-02-27
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5875834A (en) * 1981-10-30 1983-05-07 Hitachi Ltd Mask alignment device
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPS58156937A (en) * 1982-03-12 1983-09-19 Hitachi Ltd Exposing device
JPS58175631U (en) * 1982-05-18 1983-11-24 株式会社東芝 parallelization device
JPS5917247A (en) * 1982-07-21 1984-01-28 Hitachi Ltd Exposure method and its device
JPS5933828A (en) * 1982-08-04 1984-02-23 ザ・パ−キン−エルマ−・コ−ポレイシヨン Device for centering mask or wafer element used for x-ray lithography and controlling space thereof
JPS5975625A (en) * 1982-10-22 1984-04-28 Fujitsu Ltd Supporting method for substrate
JPS60100004A (en) * 1983-11-04 1985-06-03 Canon Inc Regulating device of space
JPS60100005A (en) * 1983-11-04 1985-06-03 Canon Inc Regulating device of space
JPS6099671A (en) * 1983-11-04 1985-06-03 Canon Inc Heat transfer recorder
JPS611021A (en) * 1985-05-13 1986-01-07 Hitachi Ltd Position setting method in exposing apparatus
JPS62279629A (en) * 1986-05-28 1987-12-04 Hitachi Ltd Exposure equipment
JPS6350708A (en) * 1986-08-20 1988-03-03 Fujitsu Ltd Gap matching method in x-ray exposure
US4932781A (en) * 1983-11-04 1990-06-12 Canon Kabushiki Kaisha Gap measuring apparatus using interference fringes of reflected light
WO2017018184A1 (en) * 2015-07-29 2017-02-02 三菱重工業株式会社 Gap measuring device and gap measuring system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4722213U (en) * 1971-04-09 1972-11-13
JPS49122756A (en) * 1973-03-26 1974-11-25

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4722213U (en) * 1971-04-09 1972-11-13
JPS49122756A (en) * 1973-03-26 1974-11-25

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS56164550U (en) * 1980-05-08 1981-12-07
JPS56164549U (en) * 1980-05-08 1981-12-07
JPS6144427Y2 (en) * 1980-05-08 1986-12-15
JPS6144428Y2 (en) * 1980-05-08 1986-12-15
JPS5712743U (en) * 1980-06-23 1982-01-22
JPS6218033Y2 (en) * 1980-06-23 1987-05-09
JPS5737246U (en) * 1980-08-13 1982-02-27
JPS6144429Y2 (en) * 1980-08-13 1986-12-15
JPS6349892B2 (en) * 1981-06-12 1988-10-06 Hitachi Ltd
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5875834A (en) * 1981-10-30 1983-05-07 Hitachi Ltd Mask alignment device
JPH0311540B2 (en) * 1981-10-30 1991-02-18 Hitachi Ltd
JPH035652B2 (en) * 1981-12-16 1991-01-28 Nippon Kogaku Kk
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPS58156937A (en) * 1982-03-12 1983-09-19 Hitachi Ltd Exposing device
JPS58175631U (en) * 1982-05-18 1983-11-24 株式会社東芝 parallelization device
JPS6349895B2 (en) * 1982-07-21 1988-10-06 Hitachi Ltd
JPS5917247A (en) * 1982-07-21 1984-01-28 Hitachi Ltd Exposure method and its device
JPH0562450B2 (en) * 1982-08-04 1993-09-08 Perkin Elmer Corp
JPS5933828A (en) * 1982-08-04 1984-02-23 ザ・パ−キン−エルマ−・コ−ポレイシヨン Device for centering mask or wafer element used for x-ray lithography and controlling space thereof
JPS5975625A (en) * 1982-10-22 1984-04-28 Fujitsu Ltd Supporting method for substrate
JPS60100004A (en) * 1983-11-04 1985-06-03 Canon Inc Regulating device of space
US4932781A (en) * 1983-11-04 1990-06-12 Canon Kabushiki Kaisha Gap measuring apparatus using interference fringes of reflected light
JPS60100005A (en) * 1983-11-04 1985-06-03 Canon Inc Regulating device of space
JPS6099671A (en) * 1983-11-04 1985-06-03 Canon Inc Heat transfer recorder
JPS611021A (en) * 1985-05-13 1986-01-07 Hitachi Ltd Position setting method in exposing apparatus
JPS62279629A (en) * 1986-05-28 1987-12-04 Hitachi Ltd Exposure equipment
JPS6350708A (en) * 1986-08-20 1988-03-03 Fujitsu Ltd Gap matching method in x-ray exposure
WO2017018184A1 (en) * 2015-07-29 2017-02-02 三菱重工業株式会社 Gap measuring device and gap measuring system
JP2017032308A (en) * 2015-07-29 2017-02-09 三菱重工業株式会社 Gap measurement device and gap control system
CN107636417A (en) * 2015-07-29 2018-01-26 三菱重工业株式会社 Gap measuring apparatus and gap management system

Also Published As

Publication number Publication date
JPS579004B2 (en) 1982-02-19

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