JPS5372464A - Method and apparatus for rotary coating - Google Patents
Method and apparatus for rotary coatingInfo
- Publication number
- JPS5372464A JPS5372464A JP14824376A JP14824376A JPS5372464A JP S5372464 A JPS5372464 A JP S5372464A JP 14824376 A JP14824376 A JP 14824376A JP 14824376 A JP14824376 A JP 14824376A JP S5372464 A JPS5372464 A JP S5372464A
- Authority
- JP
- Japan
- Prior art keywords
- rotary coating
- substrate
- photo resist
- readhering
- repulsed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
PURPOSE: To prevent the photo resist from readhering to the substrate repulsed from the well and to form uniform resist film, by catching the photo resist removed and radiated from the circumference of substrate at the wall and melting immediately.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14824376A JPS5372464A (en) | 1976-12-08 | 1976-12-08 | Method and apparatus for rotary coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14824376A JPS5372464A (en) | 1976-12-08 | 1976-12-08 | Method and apparatus for rotary coating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5372464A true JPS5372464A (en) | 1978-06-27 |
Family
ID=15448431
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14824376A Pending JPS5372464A (en) | 1976-12-08 | 1976-12-08 | Method and apparatus for rotary coating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5372464A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57135067A (en) * | 1981-02-16 | 1982-08-20 | Tokyo Denshi Kagaku Kabushiki | Thin film-applying machine |
JPS5863744U (en) * | 1981-10-23 | 1983-04-28 | 富士通株式会社 | spin coater |
JPS58144830U (en) * | 1982-03-24 | 1983-09-29 | 富士通株式会社 | spin coater |
JPS63134076A (en) * | 1986-11-25 | 1988-06-06 | Toshiba Corp | Method and device for coating |
US4790262A (en) * | 1985-10-07 | 1988-12-13 | Tokyo Denshi Kagaku Co., Ltd. | Thin-film coating apparatus |
JPH01156776U (en) * | 1988-04-20 | 1989-10-27 | ||
US5095848A (en) * | 1989-05-02 | 1992-03-17 | Mitsubishi Denki Kabushiki Kaisha | Spin coating apparatus using a tilting chuck |
US5264246A (en) * | 1989-05-02 | 1993-11-23 | Mitsubishi Denki Kabushiki Kaisha | Spin coating method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5174240A (en) * | 1974-12-24 | 1976-06-28 | Tokyo Shibaura Electric Co |
-
1976
- 1976-12-08 JP JP14824376A patent/JPS5372464A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5174240A (en) * | 1974-12-24 | 1976-06-28 | Tokyo Shibaura Electric Co |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57135067A (en) * | 1981-02-16 | 1982-08-20 | Tokyo Denshi Kagaku Kabushiki | Thin film-applying machine |
US4528934A (en) * | 1981-02-16 | 1985-07-16 | Tokyo Denshi Kagaku Kabushiki Kaisha | Thin-film coating apparatus |
JPS6341630B2 (en) * | 1981-02-16 | 1988-08-18 | Tokyo Ohka Kogyo Co Ltd | |
JPS5863744U (en) * | 1981-10-23 | 1983-04-28 | 富士通株式会社 | spin coater |
JPS58144830U (en) * | 1982-03-24 | 1983-09-29 | 富士通株式会社 | spin coater |
US4790262A (en) * | 1985-10-07 | 1988-12-13 | Tokyo Denshi Kagaku Co., Ltd. | Thin-film coating apparatus |
JPS63134076A (en) * | 1986-11-25 | 1988-06-06 | Toshiba Corp | Method and device for coating |
JPH01156776U (en) * | 1988-04-20 | 1989-10-27 | ||
US5095848A (en) * | 1989-05-02 | 1992-03-17 | Mitsubishi Denki Kabushiki Kaisha | Spin coating apparatus using a tilting chuck |
US5264246A (en) * | 1989-05-02 | 1993-11-23 | Mitsubishi Denki Kabushiki Kaisha | Spin coating method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51111076A (en) | Exposure device | |
JPS5372464A (en) | Method and apparatus for rotary coating | |
JPS52149113A (en) | Preparation of photographic photosensitive material | |
JPS5228926A (en) | Process for film coating of medicines | |
JPS5227367A (en) | Photo resist processing apparatus | |
JPS53126861A (en) | Formation method of pattern-type powder substance coating layer | |
JPS522531A (en) | Method for preventing wear at the surface of a phtosensitive member an d film formation at toner surface | |
JPS51124920A (en) | Method for preparing photographic light sensitive materials | |
JPS51114445A (en) | An apparatus for controlling a coating process | |
JPS52144971A (en) | Spin coating device | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS5339137A (en) | Electronic photograph fixing apparatus | |
JPS5228267A (en) | Minute processing | |
JPS5334280A (en) | Apparatus for conveying bond-cated core | |
JPS51146223A (en) | Process for indicating the data of photograph | |
JPS51147324A (en) | Solvent for electronic wire resist | |
JPS51120731A (en) | Electronic photographing sensitive material | |
JPS525269A (en) | Rotary coating device | |
JPS5329720A (en) | Developing device for diazo photo-sensitive paper | |
JPS5369582A (en) | Coating method for photo-resist | |
JPS5320319A (en) | Data photographing device for camera | |
JPS52113574A (en) | Apparatus for treating garbages | |
JPS5358775A (en) | Production of diaphragm for electron beam exposure apparatus | |
JPS522729A (en) | Photograph device | |
JPS51126835A (en) | A production method of electronic photography photosensitive material |