JPS5227367A - Photo resist processing apparatus - Google Patents
Photo resist processing apparatusInfo
- Publication number
- JPS5227367A JPS5227367A JP10297175A JP10297175A JPS5227367A JP S5227367 A JPS5227367 A JP S5227367A JP 10297175 A JP10297175 A JP 10297175A JP 10297175 A JP10297175 A JP 10297175A JP S5227367 A JPS5227367 A JP S5227367A
- Authority
- JP
- Japan
- Prior art keywords
- photo resist
- resist processing
- processing apparatus
- processing
- stabilized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a photo resist processing equipment, through which stabilized and consistent processing can be ensured, continuous processing for different lots of various types is possible, and good yield is secured for photo resist processing.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10297175A JPS5227367A (en) | 1975-08-27 | 1975-08-27 | Photo resist processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10297175A JPS5227367A (en) | 1975-08-27 | 1975-08-27 | Photo resist processing apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59092849A Division JPS605516A (en) | 1984-05-11 | 1984-05-11 | Device for processing semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5227367A true JPS5227367A (en) | 1977-03-01 |
Family
ID=14341634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10297175A Pending JPS5227367A (en) | 1975-08-27 | 1975-08-27 | Photo resist processing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5227367A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5473475A (en) * | 1977-11-24 | 1979-06-12 | Hitachi Ltd | Device for washing and drying |
JPS5480081A (en) * | 1977-12-09 | 1979-06-26 | Ulvac Corp | Process plate vacuum device |
JPS57118639A (en) * | 1981-01-16 | 1982-07-23 | Toshiba Corp | Process control of semiconductor photo-etching |
JPS58199349A (en) * | 1982-05-17 | 1983-11-19 | Toshiba Corp | In-line device of photoetching |
JPS59159943U (en) * | 1983-04-13 | 1984-10-26 | 富士通株式会社 | semiconductor processing equipment |
JPH0255360A (en) * | 1988-08-22 | 1990-02-23 | Tokyo Electron Ltd | Regist processor |
JPH08227928A (en) * | 1988-02-12 | 1996-09-03 | Tokyo Electron Ltd | System and method for processing resist |
JPH08227929A (en) * | 1988-02-12 | 1996-09-03 | Tokyo Electron Ltd | Processing system |
-
1975
- 1975-08-27 JP JP10297175A patent/JPS5227367A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5473475A (en) * | 1977-11-24 | 1979-06-12 | Hitachi Ltd | Device for washing and drying |
JPS5480081A (en) * | 1977-12-09 | 1979-06-26 | Ulvac Corp | Process plate vacuum device |
JPS5653206B2 (en) * | 1977-12-09 | 1981-12-17 | ||
JPS57118639A (en) * | 1981-01-16 | 1982-07-23 | Toshiba Corp | Process control of semiconductor photo-etching |
JPS58199349A (en) * | 1982-05-17 | 1983-11-19 | Toshiba Corp | In-line device of photoetching |
JPS59159943U (en) * | 1983-04-13 | 1984-10-26 | 富士通株式会社 | semiconductor processing equipment |
JPH08227928A (en) * | 1988-02-12 | 1996-09-03 | Tokyo Electron Ltd | System and method for processing resist |
JPH08227929A (en) * | 1988-02-12 | 1996-09-03 | Tokyo Electron Ltd | Processing system |
JPH0255360A (en) * | 1988-08-22 | 1990-02-23 | Tokyo Electron Ltd | Regist processor |
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