JPS5473475A - Device for washing and drying - Google Patents

Device for washing and drying

Info

Publication number
JPS5473475A
JPS5473475A JP13999177A JP13999177A JPS5473475A JP S5473475 A JPS5473475 A JP S5473475A JP 13999177 A JP13999177 A JP 13999177A JP 13999177 A JP13999177 A JP 13999177A JP S5473475 A JPS5473475 A JP S5473475A
Authority
JP
Japan
Prior art keywords
wafers
turntable
drying
washing
station
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13999177A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Hisao Seki
Tetsuya Takagaki
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13999177A priority Critical patent/JPS5473475A/en
Publication of JPS5473475A publication Critical patent/JPS5473475A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To accelerate washing and drying and heighten the effect of the washing and drying, by sequentially transferring wafers to the cartridges of a rotary washing station and a rotary drying station to wash and dry the wafers.
CONSTITUTION: Four cartridges 2, each of which contains a plurality of semiconductor wafers 4, are set on a turntable 3 of a loader A so that the wafers 4 are sequentially transferred to the turntable 12 of the washing station B by a conveyor 6. Water is projected to the wafers 4 fixed by suction on the turntable 12 to wash away dusts etc. from the wafers. Then, the projection of the water is stopped. The water on the wafers 4 is removed so that the wafers are tentatively dried. Thereafter, the turntable 12 is intermittently driven to move the wafers 4 into a holder 16 on the turntable 15 of the drying station D by the conveyor. The wafers 4 are dried while the drying station D is kept under a nitrogen atmosphere and the turntable 15 is rotated. Then, the turntable 15 is intermittently driven further to put the dried wafers 4 into a wafer cartridge 18 on the turntable 17 of an unloader E.
COPYRIGHT: (C)1979,JPO&Japio
JP13999177A 1977-11-24 1977-11-24 Device for washing and drying Pending JPS5473475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13999177A JPS5473475A (en) 1977-11-24 1977-11-24 Device for washing and drying

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13999177A JPS5473475A (en) 1977-11-24 1977-11-24 Device for washing and drying

Publications (1)

Publication Number Publication Date
JPS5473475A true JPS5473475A (en) 1979-06-12

Family

ID=15258384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13999177A Pending JPS5473475A (en) 1977-11-24 1977-11-24 Device for washing and drying

Country Status (1)

Country Link
JP (1) JPS5473475A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5736833A (en) * 1980-08-15 1982-02-27 Hitachi Ltd Cleaning of wafer
JPS57154835A (en) * 1981-03-20 1982-09-24 Hitachi Ltd Method and apparatus for drying tabular material
WO1999020407A1 (en) * 1997-10-22 1999-04-29 Hitachi, Ltd. Apparatus for treating plate type part with fluid
US6401734B1 (en) * 1999-03-11 2002-06-11 Hitachi Kokusai Electric Inc. Substrate treating apparatus
CN106733936A (en) * 2016-11-30 2017-05-31 东莞市天合机电开发有限公司 A kind of dust exhaust apparatus on the automatic assembly line of stator
CN108927372A (en) * 2018-06-22 2018-12-04 浙江铁流离合器股份有限公司 A kind of high efficiency clutch friction plate cleaning equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4939313A (en) * 1972-08-15 1974-04-12
JPS5227367A (en) * 1975-08-27 1977-03-01 Hitachi Ltd Photo resist processing apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4939313A (en) * 1972-08-15 1974-04-12
JPS5227367A (en) * 1975-08-27 1977-03-01 Hitachi Ltd Photo resist processing apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5736833A (en) * 1980-08-15 1982-02-27 Hitachi Ltd Cleaning of wafer
JPS57154835A (en) * 1981-03-20 1982-09-24 Hitachi Ltd Method and apparatus for drying tabular material
WO1999020407A1 (en) * 1997-10-22 1999-04-29 Hitachi, Ltd. Apparatus for treating plate type part with fluid
US6374836B1 (en) * 1997-10-22 2002-04-23 Hitachi, Ltd. Apparatus for treating plate type part with fluid
US6401734B1 (en) * 1999-03-11 2002-06-11 Hitachi Kokusai Electric Inc. Substrate treating apparatus
CN106733936A (en) * 2016-11-30 2017-05-31 东莞市天合机电开发有限公司 A kind of dust exhaust apparatus on the automatic assembly line of stator
CN108927372A (en) * 2018-06-22 2018-12-04 浙江铁流离合器股份有限公司 A kind of high efficiency clutch friction plate cleaning equipment

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