JPS5473475A - Device for washing and drying - Google Patents
Device for washing and dryingInfo
- Publication number
- JPS5473475A JPS5473475A JP13999177A JP13999177A JPS5473475A JP S5473475 A JPS5473475 A JP S5473475A JP 13999177 A JP13999177 A JP 13999177A JP 13999177 A JP13999177 A JP 13999177A JP S5473475 A JPS5473475 A JP S5473475A
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- turntable
- drying
- washing
- station
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To accelerate washing and drying and heighten the effect of the washing and drying, by sequentially transferring wafers to the cartridges of a rotary washing station and a rotary drying station to wash and dry the wafers.
CONSTITUTION: Four cartridges 2, each of which contains a plurality of semiconductor wafers 4, are set on a turntable 3 of a loader A so that the wafers 4 are sequentially transferred to the turntable 12 of the washing station B by a conveyor 6. Water is projected to the wafers 4 fixed by suction on the turntable 12 to wash away dusts etc. from the wafers. Then, the projection of the water is stopped. The water on the wafers 4 is removed so that the wafers are tentatively dried. Thereafter, the turntable 12 is intermittently driven to move the wafers 4 into a holder 16 on the turntable 15 of the drying station D by the conveyor. The wafers 4 are dried while the drying station D is kept under a nitrogen atmosphere and the turntable 15 is rotated. Then, the turntable 15 is intermittently driven further to put the dried wafers 4 into a wafer cartridge 18 on the turntable 17 of an unloader E.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13999177A JPS5473475A (en) | 1977-11-24 | 1977-11-24 | Device for washing and drying |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13999177A JPS5473475A (en) | 1977-11-24 | 1977-11-24 | Device for washing and drying |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8178484A Division JPS605530A (en) | 1984-04-25 | 1984-04-25 | Treating device for wafer surface |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5473475A true JPS5473475A (en) | 1979-06-12 |
Family
ID=15258384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13999177A Pending JPS5473475A (en) | 1977-11-24 | 1977-11-24 | Device for washing and drying |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5473475A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5736833A (en) * | 1980-08-15 | 1982-02-27 | Hitachi Ltd | Cleaning of wafer |
JPS57154835A (en) * | 1981-03-20 | 1982-09-24 | Hitachi Ltd | Method and apparatus for drying tabular material |
WO1999020407A1 (en) * | 1997-10-22 | 1999-04-29 | Hitachi, Ltd. | Apparatus for treating plate type part with fluid |
US6401734B1 (en) * | 1999-03-11 | 2002-06-11 | Hitachi Kokusai Electric Inc. | Substrate treating apparatus |
CN106733936A (en) * | 2016-11-30 | 2017-05-31 | 东莞市天合机电开发有限公司 | A kind of dust exhaust apparatus on the automatic assembly line of stator |
JP2018170443A (en) * | 2017-03-30 | 2018-11-01 | 株式会社東京精密 | Spinner cleaning device |
CN108927372A (en) * | 2018-06-22 | 2018-12-04 | 浙江铁流离合器股份有限公司 | A kind of high efficiency clutch friction plate cleaning equipment |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4939313A (en) * | 1972-08-15 | 1974-04-12 | ||
JPS5227367A (en) * | 1975-08-27 | 1977-03-01 | Hitachi Ltd | Photo resist processing apparatus |
-
1977
- 1977-11-24 JP JP13999177A patent/JPS5473475A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4939313A (en) * | 1972-08-15 | 1974-04-12 | ||
JPS5227367A (en) * | 1975-08-27 | 1977-03-01 | Hitachi Ltd | Photo resist processing apparatus |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5736833A (en) * | 1980-08-15 | 1982-02-27 | Hitachi Ltd | Cleaning of wafer |
JPS57154835A (en) * | 1981-03-20 | 1982-09-24 | Hitachi Ltd | Method and apparatus for drying tabular material |
WO1999020407A1 (en) * | 1997-10-22 | 1999-04-29 | Hitachi, Ltd. | Apparatus for treating plate type part with fluid |
US6374836B1 (en) * | 1997-10-22 | 2002-04-23 | Hitachi, Ltd. | Apparatus for treating plate type part with fluid |
US6401734B1 (en) * | 1999-03-11 | 2002-06-11 | Hitachi Kokusai Electric Inc. | Substrate treating apparatus |
CN106733936A (en) * | 2016-11-30 | 2017-05-31 | 东莞市天合机电开发有限公司 | A kind of dust exhaust apparatus on the automatic assembly line of stator |
JP2018170443A (en) * | 2017-03-30 | 2018-11-01 | 株式会社東京精密 | Spinner cleaning device |
JP2021158381A (en) * | 2017-03-30 | 2021-10-07 | 株式会社東京精密 | Spinner cleaning device |
CN108927372A (en) * | 2018-06-22 | 2018-12-04 | 浙江铁流离合器股份有限公司 | A kind of high efficiency clutch friction plate cleaning equipment |
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