JPS5536944A - Method and device for washing rectangular substrate - Google Patents

Method and device for washing rectangular substrate

Info

Publication number
JPS5536944A
JPS5536944A JP10884678A JP10884678A JPS5536944A JP S5536944 A JPS5536944 A JP S5536944A JP 10884678 A JP10884678 A JP 10884678A JP 10884678 A JP10884678 A JP 10884678A JP S5536944 A JPS5536944 A JP S5536944A
Authority
JP
Japan
Prior art keywords
substrate
compressed air
washings
washing
chuck head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10884678A
Other languages
Japanese (ja)
Inventor
Shinichi Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP10884678A priority Critical patent/JPS5536944A/en
Publication of JPS5536944A publication Critical patent/JPS5536944A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To prevent washings from sticking round to the back of an IC wafer substrate by forming an air current in the direction going away from the center at the back of the substrate.
CONSTITUTION: A member consisting of an inner ring 2 and an outer ring 3, provided with a cylindrical compressed air blowoff port on the top and also provided with a compressed air inlet port 4 is arranged on the outer perimeter of a chuck head 1 of a rectangular substrate 6 in coming near to the bottom of substrate. After fixing the rectangular substrate 6 to wash on the chuck head 1, the chuck head 1 is rotated and thus washing is carried out as discharging washings onto a running brush 8 through washings discharge nozzle 8. From introducing the compressed air 4 to the inlet port 4 in this case, a part of the compressed air blown off the port 5 forms an air current in the direction going away from the center along the back of the substrate 6. Drops of washings dispersed during washing will never stick round the back of the substrate 6.
COPYRIGHT: (C)1980,JPO&Japio
JP10884678A 1978-09-05 1978-09-05 Method and device for washing rectangular substrate Pending JPS5536944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10884678A JPS5536944A (en) 1978-09-05 1978-09-05 Method and device for washing rectangular substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10884678A JPS5536944A (en) 1978-09-05 1978-09-05 Method and device for washing rectangular substrate

Publications (1)

Publication Number Publication Date
JPS5536944A true JPS5536944A (en) 1980-03-14

Family

ID=14495058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10884678A Pending JPS5536944A (en) 1978-09-05 1978-09-05 Method and device for washing rectangular substrate

Country Status (1)

Country Link
JP (1) JPS5536944A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759337A (en) * 1980-09-29 1982-04-09 Nec Kyushu Ltd Scrubbing device for manufacturing semiconductor device
JPS5985670U (en) * 1982-12-01 1984-06-09 近藤　権士 Cleaning device for substrate holding claws
US4685975A (en) * 1982-08-03 1987-08-11 Texas Instruments Incorporated Method for edge cleaning
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
KR100841501B1 (en) 2005-12-13 2008-06-25 다이니폰 스크린 세이조우 가부시키가이샤 Substrate processing method and substrate processing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759337A (en) * 1980-09-29 1982-04-09 Nec Kyushu Ltd Scrubbing device for manufacturing semiconductor device
US4685975A (en) * 1982-08-03 1987-08-11 Texas Instruments Incorporated Method for edge cleaning
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
JPS5985670U (en) * 1982-12-01 1984-06-09 近藤　権士 Cleaning device for substrate holding claws
KR100841501B1 (en) 2005-12-13 2008-06-25 다이니폰 스크린 세이조우 가부시키가이샤 Substrate processing method and substrate processing apparatus

Similar Documents

Publication Publication Date Title
JPS5212576A (en) Wafer washing drying device
JPS5536944A (en) Method and device for washing rectangular substrate
JPS54113265A (en) Resistor developing equipement
JPH09298181A (en) Substrate rear surface washer
JPS5727168A (en) Equipment for wet treatment
JPS5599725A (en) Method and device for manufacturing semiconductor device
JP2537611B2 (en) Coating material coating equipment
JPS64742A (en) Probing device
JPS5546576A (en) Device for preventing semiconductor device from contaminating
JPS57130422A (en) Resist coating and developing device
JPS5575223A (en) Manufacturing semiconductor device
JPS5473572A (en) Spin coater
JPS5394766A (en) Rotation-system processor of semiconductor wafer
JPS5548938A (en) Manufacturing of semiconductor device
JPH039328Y2 (en)
JPS5918642A (en) Manufacturing device of semiconductor device
JPS558052A (en) Rotary washer-drier
JPS569742A (en) Developing method of photosensitive resin
JPS57154836A (en) Washing method for semiconductor wafer, mask, etc.
JPS55120038A (en) Resist coating and developing device
JPS522164A (en) Wafer cleaning and drying device
JPS547769A (en) Dehydrating and rinsing washer
JPS548456A (en) Wafer cleansing/drying device
JPS5471492A (en) Wet type blast nozzle
JPS5314574A (en) Clean bench