JPS548456A - Wafer cleansing/drying device - Google Patents

Wafer cleansing/drying device

Info

Publication number
JPS548456A
JPS548456A JP7321077A JP7321077A JPS548456A JP S548456 A JPS548456 A JP S548456A JP 7321077 A JP7321077 A JP 7321077A JP 7321077 A JP7321077 A JP 7321077A JP S548456 A JPS548456 A JP S548456A
Authority
JP
Japan
Prior art keywords
cleansing
drying device
wafer
wafer cleansing
along
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7321077A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Hisao Seki
Shogo Kiyota
Tetsuya Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7321077A priority Critical patent/JPS548456A/en
Publication of JPS548456A publication Critical patent/JPS548456A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To carry out the cleansing and drying processes by flowing the gas along the inner wall of the cover positioned at the upper part of the cartridge and along the lower surface of the shielding plate distributed horizontally to the outer surface of the nozzle, and to prevent the cleansing solution from sticking to the wafer after the centrifugal drying.
COPYRIGHT: (C)1979,JPO&Japio
JP7321077A 1977-06-22 1977-06-22 Wafer cleansing/drying device Pending JPS548456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7321077A JPS548456A (en) 1977-06-22 1977-06-22 Wafer cleansing/drying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7321077A JPS548456A (en) 1977-06-22 1977-06-22 Wafer cleansing/drying device

Publications (1)

Publication Number Publication Date
JPS548456A true JPS548456A (en) 1979-01-22

Family

ID=13511556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7321077A Pending JPS548456A (en) 1977-06-22 1977-06-22 Wafer cleansing/drying device

Country Status (1)

Country Link
JP (1) JPS548456A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281068A (en) * 1990-03-29 1991-12-11 Hirakawa Tekkosho:Kk Automatic welding equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140483A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Rinser drier mechanism

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140483A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Rinser drier mechanism

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281068A (en) * 1990-03-29 1991-12-11 Hirakawa Tekkosho:Kk Automatic welding equipment

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