JPS5364472A - Processing apparatus - Google Patents
Processing apparatusInfo
- Publication number
- JPS5364472A JPS5364472A JP13957976A JP13957976A JPS5364472A JP S5364472 A JPS5364472 A JP S5364472A JP 13957976 A JP13957976 A JP 13957976A JP 13957976 A JP13957976 A JP 13957976A JP S5364472 A JPS5364472 A JP S5364472A
- Authority
- JP
- Japan
- Prior art keywords
- processing apparatus
- side wall
- wall surface
- treatment room
- inside side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To maintain the environment in a treatment room in a satisfactory state by letting a liquid form substance form substance fall onto the inside side wall surface of the treatment room from the upper part of the inside side wall surface to the lower part.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13957976A JPS5364472A (en) | 1976-11-22 | 1976-11-22 | Processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13957976A JPS5364472A (en) | 1976-11-22 | 1976-11-22 | Processing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5364472A true JPS5364472A (en) | 1978-06-08 |
Family
ID=15248536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13957976A Pending JPS5364472A (en) | 1976-11-22 | 1976-11-22 | Processing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5364472A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59176677U (en) * | 1983-05-09 | 1984-11-26 | 日本コロムビア株式会社 | Rotary coating machine |
US4688918A (en) * | 1985-06-05 | 1987-08-25 | Mitsubishi Denki Kabushiki Kaisha | Negative type photoresist developing apparatus |
US4755844A (en) * | 1985-04-30 | 1988-07-05 | Kabushiki Kaisha Toshiba | Automatic developing device |
JPH0390431U (en) * | 1989-12-28 | 1991-09-13 |
-
1976
- 1976-11-22 JP JP13957976A patent/JPS5364472A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59176677U (en) * | 1983-05-09 | 1984-11-26 | 日本コロムビア株式会社 | Rotary coating machine |
US4755844A (en) * | 1985-04-30 | 1988-07-05 | Kabushiki Kaisha Toshiba | Automatic developing device |
US4688918A (en) * | 1985-06-05 | 1987-08-25 | Mitsubishi Denki Kabushiki Kaisha | Negative type photoresist developing apparatus |
JPH0390431U (en) * | 1989-12-28 | 1991-09-13 |
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