JPS5575223A - Manufacturing semiconductor device - Google Patents

Manufacturing semiconductor device

Info

Publication number
JPS5575223A
JPS5575223A JP15032078A JP15032078A JPS5575223A JP S5575223 A JPS5575223 A JP S5575223A JP 15032078 A JP15032078 A JP 15032078A JP 15032078 A JP15032078 A JP 15032078A JP S5575223 A JPS5575223 A JP S5575223A
Authority
JP
Japan
Prior art keywords
liquid
chuck
pattern
nozzle
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15032078A
Other languages
Japanese (ja)
Inventor
Kenji Sugishima
Kazuo Tokitomo
Satoshi Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15032078A priority Critical patent/JPS5575223A/en
Publication of JPS5575223A publication Critical patent/JPS5575223A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To decrease the amount of liquid used, by dropping developing liquid to the center of rotation with a wafer being fastened to a chuck, in the case a photoresist with a specified pattern, which is formed on a semiconductor wafer, is developed.
CONSTITUTION: A semiconductor wafer 3, on which a photoresist pattern 4 is provided, is attracted by vacuum to a vacuum chuck which is rotated by motor 6. The side and the bottom of the chuck 2 are surrounded by a hood 9. Then, a nozzle 5 is provided directly over the center of the pattern 4. developing liquid D in a container 7 is pressed by very slightly pressurized N2 gas and sent to the nozzle 5 through an electromagnetic valve 8. The developing liquid D is dropped from the nozzle 5. The chuck 2 is rotated at 1,000W2,000 rotations per minute for the first 5 seconds or so, then at 3,000 rotations per minute for next 5W10sec, thereby the liquid D is spread to the edge of the pattern 4. In this constitution, the efficiency of the usage of the liquid is higher than that in the spray method and more finer patterns can be obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP15032078A 1978-12-04 1978-12-04 Manufacturing semiconductor device Pending JPS5575223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15032078A JPS5575223A (en) 1978-12-04 1978-12-04 Manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15032078A JPS5575223A (en) 1978-12-04 1978-12-04 Manufacturing semiconductor device

Publications (1)

Publication Number Publication Date
JPS5575223A true JPS5575223A (en) 1980-06-06

Family

ID=15494437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15032078A Pending JPS5575223A (en) 1978-12-04 1978-12-04 Manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5575223A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPS61160930A (en) * 1985-01-09 1986-07-21 Dainippon Screen Mfg Co Ltd Method of supplying surface treatment solution for substrate
JPS62187680U (en) * 1986-05-20 1987-11-28

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPH0144011B2 (en) * 1983-02-09 1989-09-25 Matsushita Electronics Corp
JPS61160930A (en) * 1985-01-09 1986-07-21 Dainippon Screen Mfg Co Ltd Method of supplying surface treatment solution for substrate
JPH0237690B2 (en) * 1985-01-09 1990-08-27 Dainippon Screen Mfg
JPS62187680U (en) * 1986-05-20 1987-11-28
JPH0446860Y2 (en) * 1986-05-20 1992-11-05

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