JPS5575223A - Manufacturing semiconductor device - Google Patents
Manufacturing semiconductor deviceInfo
- Publication number
- JPS5575223A JPS5575223A JP15032078A JP15032078A JPS5575223A JP S5575223 A JPS5575223 A JP S5575223A JP 15032078 A JP15032078 A JP 15032078A JP 15032078 A JP15032078 A JP 15032078A JP S5575223 A JPS5575223 A JP S5575223A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- chuck
- pattern
- nozzle
- constitution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To decrease the amount of liquid used, by dropping developing liquid to the center of rotation with a wafer being fastened to a chuck, in the case a photoresist with a specified pattern, which is formed on a semiconductor wafer, is developed.
CONSTITUTION: A semiconductor wafer 3, on which a photoresist pattern 4 is provided, is attracted by vacuum to a vacuum chuck which is rotated by motor 6. The side and the bottom of the chuck 2 are surrounded by a hood 9. Then, a nozzle 5 is provided directly over the center of the pattern 4. developing liquid D in a container 7 is pressed by very slightly pressurized N2 gas and sent to the nozzle 5 through an electromagnetic valve 8. The developing liquid D is dropped from the nozzle 5. The chuck 2 is rotated at 1,000W2,000 rotations per minute for the first 5 seconds or so, then at 3,000 rotations per minute for next 5W10sec, thereby the liquid D is spread to the edge of the pattern 4. In this constitution, the efficiency of the usage of the liquid is higher than that in the spray method and more finer patterns can be obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15032078A JPS5575223A (en) | 1978-12-04 | 1978-12-04 | Manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15032078A JPS5575223A (en) | 1978-12-04 | 1978-12-04 | Manufacturing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5575223A true JPS5575223A (en) | 1980-06-06 |
Family
ID=15494437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15032078A Pending JPS5575223A (en) | 1978-12-04 | 1978-12-04 | Manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5575223A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59145525A (en) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | Resist development |
JPS61160930A (en) * | 1985-01-09 | 1986-07-21 | Dainippon Screen Mfg Co Ltd | Method of supplying surface treatment solution for substrate |
JPS62187680U (en) * | 1986-05-20 | 1987-11-28 |
-
1978
- 1978-12-04 JP JP15032078A patent/JPS5575223A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59145525A (en) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | Resist development |
JPH0144011B2 (en) * | 1983-02-09 | 1989-09-25 | Matsushita Electronics Corp | |
JPS61160930A (en) * | 1985-01-09 | 1986-07-21 | Dainippon Screen Mfg Co Ltd | Method of supplying surface treatment solution for substrate |
JPH0237690B2 (en) * | 1985-01-09 | 1990-08-27 | Dainippon Screen Mfg | |
JPS62187680U (en) * | 1986-05-20 | 1987-11-28 | ||
JPH0446860Y2 (en) * | 1986-05-20 | 1992-11-05 |
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