JPS575046A - Developing apparatus for photoresist - Google Patents

Developing apparatus for photoresist

Info

Publication number
JPS575046A
JPS575046A JP7966380A JP7966380A JPS575046A JP S575046 A JPS575046 A JP S575046A JP 7966380 A JP7966380 A JP 7966380A JP 7966380 A JP7966380 A JP 7966380A JP S575046 A JPS575046 A JP S575046A
Authority
JP
Japan
Prior art keywords
nozzle
opened
valve
photoresist
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7966380A
Other languages
Japanese (ja)
Inventor
Manabu Tateishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP7966380A priority Critical patent/JPS575046A/en
Publication of JPS575046A publication Critical patent/JPS575046A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

PURPOSE:To simplify a developing apparatus and to enhance the reliablity by a means of conducting plural processes with a single nozzle by connecting plural kinds of chemical solns. to the single nozzle through plural on-off valves. CONSTITUTION:A tightly sealed vessel 1 is provided with a table 4 supporting a semiconductor substrate 12, a constant rate motor 5 is combined with the table 4 and a nozzle 3 atomizing and spraying chemical solns. 8, 9 for processing. By spraying an atomized chemical soln. 2 from an upper part of the substrate 12 through the nozzle 3, a photoresist is developed. When the photoresist is developed, an on- off valve 10 connected to a compressed air source 11 for spraying is opened, and simultaneously an on-off valve 6 connected to a developer is opened to spray the developer through the nozzle. When rinsing is carried out, the valve 10 is opened, and simultaneously an on-off valve 7 connected to a rinsing soln. is opened to spray the soln. through the nozzle in a similar way.
JP7966380A 1980-06-13 1980-06-13 Developing apparatus for photoresist Pending JPS575046A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7966380A JPS575046A (en) 1980-06-13 1980-06-13 Developing apparatus for photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7966380A JPS575046A (en) 1980-06-13 1980-06-13 Developing apparatus for photoresist

Publications (1)

Publication Number Publication Date
JPS575046A true JPS575046A (en) 1982-01-11

Family

ID=13696391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7966380A Pending JPS575046A (en) 1980-06-13 1980-06-13 Developing apparatus for photoresist

Country Status (1)

Country Link
JP (1) JPS575046A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117732A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
JPS60117734A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
JPS60240604A (en) * 1984-05-04 1985-11-29 エービー　テトラ　パック Method and device for packaging film
JPS6161159A (en) * 1984-08-31 1986-03-28 Hoya Corp Spray developing method
US6425837B1 (en) * 2000-03-13 2002-07-30 Sanden Corporation Power transmission
JP2002217093A (en) * 2001-01-23 2002-08-02 Canon Inc System for producing semiconductor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117732A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
JPS60117734A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
JPS60240604A (en) * 1984-05-04 1985-11-29 エービー　テトラ　パック Method and device for packaging film
JPS6161159A (en) * 1984-08-31 1986-03-28 Hoya Corp Spray developing method
US6425837B1 (en) * 2000-03-13 2002-07-30 Sanden Corporation Power transmission
JP2002217093A (en) * 2001-01-23 2002-08-02 Canon Inc System for producing semiconductor

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