JPS575046A - Developing apparatus for photoresist - Google Patents
Developing apparatus for photoresistInfo
- Publication number
- JPS575046A JPS575046A JP7966380A JP7966380A JPS575046A JP S575046 A JPS575046 A JP S575046A JP 7966380 A JP7966380 A JP 7966380A JP 7966380 A JP7966380 A JP 7966380A JP S575046 A JPS575046 A JP S575046A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- opened
- valve
- photoresist
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Abstract
PURPOSE:To simplify a developing apparatus and to enhance the reliablity by a means of conducting plural processes with a single nozzle by connecting plural kinds of chemical solns. to the single nozzle through plural on-off valves. CONSTITUTION:A tightly sealed vessel 1 is provided with a table 4 supporting a semiconductor substrate 12, a constant rate motor 5 is combined with the table 4 and a nozzle 3 atomizing and spraying chemical solns. 8, 9 for processing. By spraying an atomized chemical soln. 2 from an upper part of the substrate 12 through the nozzle 3, a photoresist is developed. When the photoresist is developed, an on- off valve 10 connected to a compressed air source 11 for spraying is opened, and simultaneously an on-off valve 6 connected to a developer is opened to spray the developer through the nozzle. When rinsing is carried out, the valve 10 is opened, and simultaneously an on-off valve 7 connected to a rinsing soln. is opened to spray the soln. through the nozzle in a similar way.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7966380A JPS575046A (en) | 1980-06-13 | 1980-06-13 | Developing apparatus for photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7966380A JPS575046A (en) | 1980-06-13 | 1980-06-13 | Developing apparatus for photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS575046A true JPS575046A (en) | 1982-01-11 |
Family
ID=13696391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7966380A Pending JPS575046A (en) | 1980-06-13 | 1980-06-13 | Developing apparatus for photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS575046A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60117732A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
JPS60117734A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
JPS60240604A (en) * | 1984-05-04 | 1985-11-29 | エービー テトラ パック | Method and device for packaging film |
JPS6161159A (en) * | 1984-08-31 | 1986-03-28 | Hoya Corp | Spray developing method |
US6425837B1 (en) * | 2000-03-13 | 2002-07-30 | Sanden Corporation | Power transmission |
JP2002217093A (en) * | 2001-01-23 | 2002-08-02 | Canon Inc | System for producing semiconductor |
-
1980
- 1980-06-13 JP JP7966380A patent/JPS575046A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60117732A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
JPS60117734A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
JPS60240604A (en) * | 1984-05-04 | 1985-11-29 | エービー テトラ パック | Method and device for packaging film |
JPS6161159A (en) * | 1984-08-31 | 1986-03-28 | Hoya Corp | Spray developing method |
US6425837B1 (en) * | 2000-03-13 | 2002-07-30 | Sanden Corporation | Power transmission |
JP2002217093A (en) * | 2001-01-23 | 2002-08-02 | Canon Inc | System for producing semiconductor |
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