JPS57186750A - Applying method of photoresist - Google Patents

Applying method of photoresist

Info

Publication number
JPS57186750A
JPS57186750A JP7165581A JP7165581A JPS57186750A JP S57186750 A JPS57186750 A JP S57186750A JP 7165581 A JP7165581 A JP 7165581A JP 7165581 A JP7165581 A JP 7165581A JP S57186750 A JPS57186750 A JP S57186750A
Authority
JP
Japan
Prior art keywords
wafer
resist
surrounding part
photoresist
applying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7165581A
Other languages
Japanese (ja)
Inventor
Yasushi Okuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7165581A priority Critical patent/JPS57186750A/en
Publication of JPS57186750A publication Critical patent/JPS57186750A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To prevent the surrounding part and side surface of a wafer from applying of photoresist, by covering the surrounding part of the wafer with a cover in case of applying with a shower or in spraying. CONSTITUTION:A nozzle to blow photoresist liquid, specially a positive type liquid to a wafer in showering or spraying is provided, and a wafer 31 which applies a resist is provided under the nozzle. Around the wafer 31, a cover 42 is fitted only to a surrounding part so that the resist is not applied on it. By this way, it is eliminated that the resist rises to become thicker around the wafer and the resist adheres to its side surface. Specially in case that a positive type resist is used, a light does not reach easily to the surrounding part and side surface of the wafer and the resist remains often there, therefore this way is effective.
JP7165581A 1981-05-12 1981-05-12 Applying method of photoresist Pending JPS57186750A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7165581A JPS57186750A (en) 1981-05-12 1981-05-12 Applying method of photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7165581A JPS57186750A (en) 1981-05-12 1981-05-12 Applying method of photoresist

Publications (1)

Publication Number Publication Date
JPS57186750A true JPS57186750A (en) 1982-11-17

Family

ID=13466836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7165581A Pending JPS57186750A (en) 1981-05-12 1981-05-12 Applying method of photoresist

Country Status (1)

Country Link
JP (1) JPS57186750A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766191B2 (en) * 1984-10-29 1995-07-19 アメリカン テレフォン アンド テレグラフ カムパニー Device fabrication method using non-planar surface lithography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766191B2 (en) * 1984-10-29 1995-07-19 アメリカン テレフォン アンド テレグラフ カムパニー Device fabrication method using non-planar surface lithography

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