JPS59145525A - Resist development - Google Patents

Abstract

PURPOSE:To realize a continuous processing and perform resist development quickly by a method wherein development liquid, rinsing liquid and the like are let flow down in a thin laminar flow along the surface of a resist layer and the development of the resist layer and pattern formation are performed in the laminar flow. CONSTITUTION:A specimen 12 is transferred from a loading room 1 into a development chamber 2 and gradually covered by a laminar flow 13 and a required pattern is formed from a resist layer 16. The condition of the resist pattern is checked by a sensor 15 which detects the end point and controlled by changing the development time by changing the transfer speed of the belt. The specimen 12 is transferred through a barrier 7-2 into a rinsing chamber 3 and rinsed. After rinsing, the specimen 12 is exposed to a gas supplied from a nozzle 7-3 in a drying chamber 4. Then the specimen 12 is transferred through a baking chamber 5 into an unloading chamber 6 and packed in a cassette there.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a resist developing method used in photolithographic processes in semiconductor manufacturing.

Conventional I'fl'f formation and its problems 1. In mask production in the manufacture of core device illumination and photolithographic process of semiconductor process, each suppression on silicon, glass dead board and O-black board When selectively etching a membrane or the like, a resist layer serving as a mask is formed on the substrate.

This single layer of regimen 1 is formed into a pattern through processes such as coating, exposure, and development. In particular, as the use of positive-type semiconductors has become widespread in the semiconductor manufacturing process in recent years, the quality of the current process has come to determine the fate of the patterns.

Conventionally, the developing method is as follows: resist 1 - silicon substrate after exposure, mask plate, etc. (hereinafter referred to as a single sample)
A method of immersing a sample in a mulberry liquor tank filled with a developer (hereinafter referred to as the tip method).1. There is a method (hereinafter referred to as the spray method) in which a developer is discharged in the form of a mist from a nozzle.

In general, the tip method has advantages such as being able to develop many parts of the HAJ at one time and maintaining a constant density during development.
What is the end point of development? Ir! I think everyone's fault is that they are difficult to control.

The spray method has the advantage of being less likely to stain the sample, but it also has disadvantages, such as not being able to process multiple samples at once and making it difficult to control the end point of development.Furthermore, it takes a long time to develop using electron beam resins, etc. In this case, since the developer is ejected in a mist, the temperature of the developing area 11 degrees decreases rapidly.
There are problems such as the problem that the image does not progress and the baking time after development is long, so it is necessary to open the whole set (V1).

OBJECTS OF THE INVENTION It is an object of the present invention to provide a method for developing a regimen which eliminates these drawbacks and allows a good resist pattern to be obtained.

FF/7 of the invention The present invention is a resist l-development method for developing and forming a pattern on a resist layer in a liquid such as a developer and a rinsing liquid that flows down in a laminar flow along the surface of the resist layer. . According to the present invention, continuous processing is possible, and development can be carried out quickly using a relatively simple device.

Description of examples The resin development method according to the present invention is continuous.

Alternatively, the sample is sent to the developing section intermittently at predetermined intervals.

In this phenomenon area, the developer is sprayed in the form of a mist or shower from a nozzle with one or more holes, and the developer is brought into direct contact with the resist surface of the sample, and then turned into a thin laminar flow at a location other than the sample surface. Expose to liquid.

For rinsing, expose the rinsing liquid to the same laminar flow.

After rinsing, expose to a drying air stream to dry.

Furthermore, it involves a series of steps of heating the sample at a predetermined temperature from the front or back side. In this method, the sample is developed in a clean laminar flow at all times, so the sample does not become contaminated as in the tip method, and the developer temperature can be kept constant, making it possible to reproduce the development conditions. Good sex. The end point of development can be detected through the laminar flow of the developer, and there is no need to remove each sheet from the Nupinner as in the spray method, so continuous processing is possible. [6
It has the advantage of being a j-element.

Next, an apparatus for implementing the resist developing method according to the present invention will be explained in detail with reference to the drawings.

Figure 1 (2L) is a front view of the apparatus for carrying out the resin development method according to the present invention, and Figure 1 (b') is the A
-A/A cross section is shown.

In FIG. 11, 1 is a sample rope ink chamber, 2il-
IX developing room, 3 is rinsing room, 4 is drying room, 5 is baking room? :I, 6 is the unloading room.

Each room is divided into partitions t, H, and Y near -1 to 7-4, and each partition wall 7-1 to 7-4 has a minimum size window necessary for moving the fittings 1. Sunlight 8-1~
8-5 is provided. The developing chamber 2 and the rinsing chamber 3 are provided with nozzles a-1 and a"-2, respectively, and the drying chamber 4 is provided with nozzles a-1 and a''-2, respectively.
is equipped with a gas blowing nozzle (V9-3).

1o is a belt for transporting the sample. A sample holding frame 11 is provided on the picket 10, and the sample holding frame 11 can hold the shape, size,
Depending on the radius, the frame portion 11 is formed into a concave or convex shape.

As a whole, the sample 1 moves continuously or intermittently from the loading chamber 1 toward the drying chamber 4 along with the movement of the sample λ31 conveying bell 1-10. Also, 12 is the trial rice.
13 is a laminar flow of the developer, and the sample, the holding part 11 or the sample 1
It flows down the surface of 112. Reference numeral 14 denotes a laminar flow generating section for converting the developer coming out from the nozzle/L'9-1 into a laminar flow 13. 15 is a sensor for detecting the end point of development. 16 is a single layer of resin 1 applied to the t2 adhesive 112. 17 is a hammer part for collecting developer and rinsing liquid; it is a filter (
(not shown).

FIG. 1(C) shows the sample in FIG. 1(b), holding frame part 1.
1, in which 18 is a driving chain, 19 is a driving gear, and 20 is a motor. The health 1-10 provided with the sample holding frame 11 is in close contact with the drive chain 18. Motor 2 via drive gear 19
When the rotation of 0 is conveyed to Be/l/l-10, it is a test.”
The holding frame 11 moves continuously or intermittently at predetermined intervals, and the movement! vJ speed is sensor 1 that detects the end point of development.
It is determined by the movement stop signal from 5.

Next, the operation of this device will be explained. The sample 12 carried into the developing chamber 2 from the loading chamber 1 is covered with a laminar flow 13'L as it is carried in, and a desired pattern is formed on the resist layer 16. The state of the resist pattern is inspected by a sensor 15 that detects the end point, and is controlled by changing the developing time depending on the change in belt movement speed.

The waste material 12 that has exceeded the partition wall 7-2 enters the rinsing chamber 3,
Rinsing is done. After rinsing, the sample is exposed to the residue coming out of the nozzle 7-3 in the drying chamber 4.

4, it passes through the baking chamber 5 and is stored in the receptacle Y+- in the Asilope ink chamber 6.

If the following ji and ji configurations are adopted, the developer reservoir can be kept constant, and the reproducibility of the phenomenon conditions will be improved.

Figures 2(a) and 2(f) show the relationship between the optimum temperature and the humidity when using an electron beam resist. A granular residue is generated on the sample surface where the resist I layer 16 has been removed by development. And when it gets too high, the membrane will die. Figure 2(b)
This is an example in which the 7-grade distribution of sample A when developed by the spray method and the 7-grade distribution of sample B when developed according to the present invention are determined to be IU11. (It can be seen that the width of the temperature 11 distribution is wide, but it is narrow in the method according to the present invention.In addition, in the case of development by the spray method, resin l-1i16 may appear in a link shape or granular residues may occur.) Table 1 is an example of a comparison between the dip method, the spray method, and the method r according to the present invention. It can also be seen that the time required to process a certain number of sheets is short.It can also be seen that the number of defects is smaller compared to the dip method.

Expression 1 Ratio 1tx of 1st representation As mentioned above, in the embodiments of the present invention, the current abrasive liquid,
Linnu (at night, each nozzle is designed to spray, but close to the laminar flow generation part) 1 girl gushes out (can be used for seedling production. Drying can be done with a spinner. Baking is done with resistance) In addition to the heating type H7+-Pray 1 set, an infrared heater may be used.The developing nozzle may be of an If/f structure that can move along the sample surface so that it can be used in combination with spray development or can be switched. That's not even a big deal.

Effects of the Invention As explained above, according to the present invention, the development conditions (
1" Processing of samples with good reproducibility] 11 increases. Sample contamination is reduced. It has many advantages such as easy detection of the end point of development and automation of the phenomenon.

Figures 1W), (t)), and (C) show a front view, a sectional view, and a main part of a developing device according to an embodiment of the present invention.
FIGS. 2(2L) and 2(b) are characteristic diagrams showing the effects of the present invention.

1... Sample loading chamber, 2... Development chamber, 3
... Rinse chamber, 4 ... Drying room, 5 ... Baking room, 6 ... Sample unloading ink room, 7
-1 to 7-4... Interval 9, 9-1 to 9-3... Nozzle, 11... Sample holding frame, 12... Sample, 13... Layer Flow, 14...Laminar flow generation part.

This is a diagram showing the relationship between the 4-light fji- and the humidity in Figure 1.
A granular residue is generated on the sample surface where i716 has been removed by development. And when it gets too high, the membrane will die. Figure 2 (
b) shows sample 7 of sample A when development is done by spray method.
This is an example of the IU11 quality distribution of sample B when developed according to the present invention. In addition, in the case of development by the spray method, resin l-1i16 may be formed into links or granular residues may be generated. , Rinnui is designed to be ejected from each nozzle at night, but in close proximity to the laminar flow generation part) 1 girl gushes out (it can also be used for seedling production. Drying can be done with a spinner. In addition to the heating type E and I-Pray 1 set, an infrared heater may also be used.
It is not enough to say that it is okay to have a /f construction.

Effects of the Invention As explained above, according to the present invention, the development conditions (
I” Sample processing J11 with good reproducibility increases. Sample contamination is reduced. It has many advantages such as easy detection of the end point of development and automation of the phenomenon.

[Brief explanation of the drawing]

Figures 1 (al), (t)) and (c) are a front view, sectional view, and main parts of a developing device according to an embodiment of the present invention (illustrative diagram, Figure 2 <L); (b) is It is a characteristic diagram showing the effect of the present invention. 1... Sample loading chamber, 2... Development chamber, 3
...Rinse chamber, 4...Drying room, 5...Baking room, 6...Sample unloading ink room, 7-
1 to 7-4... Interval 9, 9-1 to 9-3... Nozzle, 11... Sample holding frame, 12... Sample,
13... Laminar flow, 14... Laminar flow generation part.

Claims (2)

[Claims] (1) A resist developing method characterized by forming a continuous pattern on the sample surface in a laminar flow of a developing liquid flowing down along the sample surface. (2) The resist developing method according to claim 1, wherein the width of the laminar flow of the developing liquid flowing down is greater than the depth of the laminar flow.