JPS57192955A - Developing method - Google Patents

Developing method

Info

Publication number
JPS57192955A
JPS57192955A JP7908081A JP7908081A JPS57192955A JP S57192955 A JPS57192955 A JP S57192955A JP 7908081 A JP7908081 A JP 7908081A JP 7908081 A JP7908081 A JP 7908081A JP S57192955 A JPS57192955 A JP S57192955A
Authority
JP
Japan
Prior art keywords
developing solution
resist film
film
development
feeder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7908081A
Other languages
Japanese (ja)
Inventor
Hiroaki Tezuka
Isao Saegusa
Yukio Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP7908081A priority Critical patent/JPS57192955A/en
Publication of JPS57192955A publication Critical patent/JPS57192955A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Abstract

PURPOSE:To perform uniform development by dropping a developing solution like a curtain while moving a developing solution feeder from one end to the other of a resist film to form a uniform developing solution film on the whole surface of the resist film, and executing spray development. CONSTITUTION:A worked plate 1 to which a resist film 2 is applied is fixed on a turntable 3 and a developing solution is dropped like a curtain from the leading edge part 5 of a developing solution feeder with a slit discharging port 4 on the resist film while moving the feeder from one end to the other of the resist film 2. Cosequently, a developing solution film 6 are formed on the whole surface of the resist film 2 and the problem that the developing solution should be contacted with the resist film 2 at first is resolved. In the next process, the developing solution is injected to the resist film 2 by a spray nozzle 7 to complete the development. After spray development, the equipment is washed with a washing solution to clean up the remaining resist scum or developing solution.
JP7908081A 1981-05-25 1981-05-25 Developing method Pending JPS57192955A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7908081A JPS57192955A (en) 1981-05-25 1981-05-25 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7908081A JPS57192955A (en) 1981-05-25 1981-05-25 Developing method

Publications (1)

Publication Number Publication Date
JPS57192955A true JPS57192955A (en) 1982-11-27

Family

ID=13679912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7908081A Pending JPS57192955A (en) 1981-05-25 1981-05-25 Developing method

Country Status (1)

Country Link
JP (1) JPS57192955A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110558A2 (en) * 1982-10-28 1984-06-13 Fujitsu Limited Method and apparatus for use in developing resist film
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPS60193552U (en) * 1984-05-31 1985-12-23 富士通株式会社 resist developing device
JPS6165435A (en) * 1984-09-07 1986-04-04 Dainippon Screen Mfg Co Ltd Method of substrate surface treatment and device therefor
JPS61112320A (en) * 1984-11-07 1986-05-30 Nec Corp Developing treating device for semiconductor substrate
JPS6230336U (en) * 1985-08-07 1987-02-24
JPS6278820A (en) * 1985-10-01 1987-04-11 Rohm Co Ltd Resist developing method
JPH01170023A (en) * 1987-12-25 1989-07-05 Casio Comput Co Ltd Photoresist developing device
JPH01253235A (en) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk Method and device for substrate treatment
JPH024986A (en) * 1987-10-31 1990-01-09 Dainippon Screen Mfg Co Ltd Surface treatment of substrate
JPH0377433U (en) * 1989-11-30 1991-08-05
US5252137A (en) * 1990-09-14 1993-10-12 Tokyo Electron Limited System and method for applying a liquid
JPH05267275A (en) * 1992-03-17 1993-10-15 Chuo Riken:Kk Wet treatment apparatus
JPH06338449A (en) * 1993-05-28 1994-12-06 Chuo Riken:Kk Method for heaping of liquid substance on surface of square substrate and outflow nozzle for square substrate
US5374312A (en) * 1991-01-23 1994-12-20 Tokyo Electron Limited Liquid coating system
JP2008182257A (en) * 2008-03-05 2008-08-07 Dainippon Screen Mfg Co Ltd Developing device and a development method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887371A (en) * 1973-12-10 1975-06-03 Rca Corp Photographic method for printing viewing-screen structure including treatment of exposed coating with ammonium compound
JPS5349955A (en) * 1976-10-18 1978-05-06 Fuji Photo Film Co Ltd Spin coating method
JPS54106304A (en) * 1978-02-09 1979-08-21 Taiyo Kogyo Co Ltd Device for projecting etching liquid to printing roll
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method
JPS5727168A (en) * 1980-07-28 1982-02-13 Hitachi Ltd Equipment for wet treatment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887371A (en) * 1973-12-10 1975-06-03 Rca Corp Photographic method for printing viewing-screen structure including treatment of exposed coating with ammonium compound
JPS5349955A (en) * 1976-10-18 1978-05-06 Fuji Photo Film Co Ltd Spin coating method
JPS54106304A (en) * 1978-02-09 1979-08-21 Taiyo Kogyo Co Ltd Device for projecting etching liquid to printing roll
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method
JPS5727168A (en) * 1980-07-28 1982-02-13 Hitachi Ltd Equipment for wet treatment

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110558A2 (en) * 1982-10-28 1984-06-13 Fujitsu Limited Method and apparatus for use in developing resist film
JPH0144011B2 (en) * 1983-02-09 1989-09-25 Matsushita Electronics Corp
JPS59145525A (en) * 1983-02-09 1984-08-21 Matsushita Electronics Corp Resist development
JPS60193552U (en) * 1984-05-31 1985-12-23 富士通株式会社 resist developing device
JPS6165435A (en) * 1984-09-07 1986-04-04 Dainippon Screen Mfg Co Ltd Method of substrate surface treatment and device therefor
JPS61112320A (en) * 1984-11-07 1986-05-30 Nec Corp Developing treating device for semiconductor substrate
JPS6230336U (en) * 1985-08-07 1987-02-24
JPS6278820A (en) * 1985-10-01 1987-04-11 Rohm Co Ltd Resist developing method
JPH0543172B2 (en) * 1985-10-01 1993-06-30 Rohm Kk
JPH024986A (en) * 1987-10-31 1990-01-09 Dainippon Screen Mfg Co Ltd Surface treatment of substrate
JPH01170023A (en) * 1987-12-25 1989-07-05 Casio Comput Co Ltd Photoresist developing device
JPH01253235A (en) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk Method and device for substrate treatment
JPH0377433U (en) * 1989-11-30 1991-08-05
US5252137A (en) * 1990-09-14 1993-10-12 Tokyo Electron Limited System and method for applying a liquid
US5374312A (en) * 1991-01-23 1994-12-20 Tokyo Electron Limited Liquid coating system
JPH05267275A (en) * 1992-03-17 1993-10-15 Chuo Riken:Kk Wet treatment apparatus
JPH06338449A (en) * 1993-05-28 1994-12-06 Chuo Riken:Kk Method for heaping of liquid substance on surface of square substrate and outflow nozzle for square substrate
JP2008182257A (en) * 2008-03-05 2008-08-07 Dainippon Screen Mfg Co Ltd Developing device and a development method

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