JPS5498574A - Rotary coating unit of viscous material - Google Patents
Rotary coating unit of viscous materialInfo
- Publication number
- JPS5498574A JPS5498574A JP537678A JP537678A JPS5498574A JP S5498574 A JPS5498574 A JP S5498574A JP 537678 A JP537678 A JP 537678A JP 537678 A JP537678 A JP 537678A JP S5498574 A JPS5498574 A JP S5498574A
- Authority
- JP
- Japan
- Prior art keywords
- test piece
- plate
- absorption
- bending
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To coat uniformly viscous material in a short time, by correctly performing vacuum absorption even for comparatively greater substrate and making possible the attachment even with substrate different in size.
CONSTITUTION: To rotary stand 31 is pushed down with the plate 32, and it is fastened with the disc 22, and the square test piece 50 is vacuum-absorbed by using the 0 ring 26. The lengthwise direction of the test piece 50 is aligned with the plate 33 and the broadwise is made with the notch 32a of the plate 32. The plate 32 is lower than the absorbed test piece surface and no hindrance to the resist sputtering is given. The plate 33 is higher than the upper surface of test piece by taking into consideration the bending of test piece, the side surface of test piece is contacted 50a and the gap 60 is formed, and sure absorption is possible even with bending caused. Further, the test piece end is contacted at the tip of the wedge 33a of the plate 33 and the resist sputtering is made easier. The plate 33 is movable to the groove 31a of the stand 31 and the test pieces of different length can be mounted with the members 34 and 35. In this case, the test piece having greater bending is possible for absorption, and the resist sputtered is flowed to the pool 31b at the external circumference and it is discharged from the hole 31c.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP537678A JPS5498574A (en) | 1978-01-20 | 1978-01-20 | Rotary coating unit of viscous material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP537678A JPS5498574A (en) | 1978-01-20 | 1978-01-20 | Rotary coating unit of viscous material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5498574A true JPS5498574A (en) | 1979-08-03 |
Family
ID=11609444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP537678A Pending JPS5498574A (en) | 1978-01-20 | 1978-01-20 | Rotary coating unit of viscous material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5498574A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6176957U (en) * | 1984-10-26 | 1986-05-23 | ||
JPS636728U (en) * | 1986-06-30 | 1988-01-18 | ||
US4788994A (en) * | 1986-08-13 | 1988-12-06 | Dainippon Screen Mfg. Co. | Wafer holding mechanism |
US4941426A (en) * | 1987-09-18 | 1990-07-17 | Tokyo Ohka Kogyo Co., Ltd. | Thin-film coating apparatus |
JPH0328722U (en) * | 1989-07-31 | 1991-03-22 | ||
US5209180A (en) * | 1991-03-28 | 1993-05-11 | Dainippon Screen Mfg. Co., Ltd. | Spin coating apparatus with an upper spin plate cleaning nozzle |
JPH06177107A (en) * | 1992-12-08 | 1994-06-24 | Dainippon Screen Mfg Co Ltd | Rotary cleaning equipment for rectangular substrate |
JPH0654146U (en) * | 1992-05-28 | 1994-07-22 | 彰浩 申 | Retractable insulator |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4931590A (en) * | 1972-07-24 | 1974-03-22 | ||
JPS50137079A (en) * | 1974-04-17 | 1975-10-30 | ||
JPS5139737A (en) * | 1974-10-01 | 1976-04-02 | Canon Kk | HAKUSOTOFUYO SUPINNAA |
JPS5114252B1 (en) * | 1969-12-29 | 1976-05-08 | ||
JPS5246903A (en) * | 1975-10-08 | 1977-04-14 | Mitsubishi Electric Corp | Rotary coating apparatus |
-
1978
- 1978-01-20 JP JP537678A patent/JPS5498574A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5114252B1 (en) * | 1969-12-29 | 1976-05-08 | ||
JPS4931590A (en) * | 1972-07-24 | 1974-03-22 | ||
JPS50137079A (en) * | 1974-04-17 | 1975-10-30 | ||
JPS5139737A (en) * | 1974-10-01 | 1976-04-02 | Canon Kk | HAKUSOTOFUYO SUPINNAA |
JPS5246903A (en) * | 1975-10-08 | 1977-04-14 | Mitsubishi Electric Corp | Rotary coating apparatus |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6176957U (en) * | 1984-10-26 | 1986-05-23 | ||
JPS636728U (en) * | 1986-06-30 | 1988-01-18 | ||
JPH0325400Y2 (en) * | 1986-06-30 | 1991-06-03 | ||
US4788994A (en) * | 1986-08-13 | 1988-12-06 | Dainippon Screen Mfg. Co. | Wafer holding mechanism |
US4941426A (en) * | 1987-09-18 | 1990-07-17 | Tokyo Ohka Kogyo Co., Ltd. | Thin-film coating apparatus |
JPH0328722U (en) * | 1989-07-31 | 1991-03-22 | ||
US5209180A (en) * | 1991-03-28 | 1993-05-11 | Dainippon Screen Mfg. Co., Ltd. | Spin coating apparatus with an upper spin plate cleaning nozzle |
JPH0654146U (en) * | 1992-05-28 | 1994-07-22 | 彰浩 申 | Retractable insulator |
JPH06177107A (en) * | 1992-12-08 | 1994-06-24 | Dainippon Screen Mfg Co Ltd | Rotary cleaning equipment for rectangular substrate |
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