JPS5498574A - Rotary coating unit of viscous material - Google Patents

Rotary coating unit of viscous material

Info

Publication number
JPS5498574A
JPS5498574A JP537678A JP537678A JPS5498574A JP S5498574 A JPS5498574 A JP S5498574A JP 537678 A JP537678 A JP 537678A JP 537678 A JP537678 A JP 537678A JP S5498574 A JPS5498574 A JP S5498574A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
test piece
plate
absorption
bending
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP537678A
Inventor
Shinzaburo Ishikawa
Mitsufumi Katano
Yasuhiko Tanigawa
Tatsuyuki Tomioka
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To coat uniformly viscous material in a short time, by correctly performing vacuum absorption even for comparatively greater substrate and making possible the attachment even with substrate different in size.
CONSTITUTION: To rotary stand 31 is pushed down with the plate 32, and it is fastened with the disc 22, and the square test piece 50 is vacuum-absorbed by using the 0 ring 26. The lengthwise direction of the test piece 50 is aligned with the plate 33 and the broadwise is made with the notch 32a of the plate 32. The plate 32 is lower than the absorbed test piece surface and no hindrance to the resist sputtering is given. The plate 33 is higher than the upper surface of test piece by taking into consideration the bending of test piece, the side surface of test piece is contacted 50a and the gap 60 is formed, and sure absorption is possible even with bending caused. Further, the test piece end is contacted at the tip of the wedge 33a of the plate 33 and the resist sputtering is made easier. The plate 33 is movable to the groove 31a of the stand 31 and the test pieces of different length can be mounted with the members 34 and 35. In this case, the test piece having greater bending is possible for absorption, and the resist sputtered is flowed to the pool 31b at the external circumference and it is discharged from the hole 31c.
COPYRIGHT: (C)1979,JPO&Japio
JP537678A 1978-01-20 1978-01-20 Rotary coating unit of viscous material Pending JPS5498574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP537678A JPS5498574A (en) 1978-01-20 1978-01-20 Rotary coating unit of viscous material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP537678A JPS5498574A (en) 1978-01-20 1978-01-20 Rotary coating unit of viscous material

Publications (1)

Publication Number Publication Date
JPS5498574A true true JPS5498574A (en) 1979-08-03

Family

ID=11609444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP537678A Pending JPS5498574A (en) 1978-01-20 1978-01-20 Rotary coating unit of viscous material

Country Status (1)

Country Link
JP (1) JPS5498574A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6176957U (en) * 1984-10-26 1986-05-23
JPS636728U (en) * 1986-06-30 1988-01-18
US4788994A (en) * 1986-08-13 1988-12-06 Dainippon Screen Mfg. Co. Wafer holding mechanism
US4941426A (en) * 1987-09-18 1990-07-17 Tokyo Ohka Kogyo Co., Ltd. Thin-film coating apparatus
JPH0328722U (en) * 1989-07-31 1991-03-22
US5209180A (en) * 1991-03-28 1993-05-11 Dainippon Screen Mfg. Co., Ltd. Spin coating apparatus with an upper spin plate cleaning nozzle
JPH06177107A (en) * 1992-12-08 1994-06-24 Dainippon Screen Mfg Co Ltd Rotary cleaning equipment for rectangular substrate
JPH0654146U (en) * 1992-05-28 1994-07-22 彰浩 申 Pull-insulator

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4931590A (en) * 1972-07-24 1974-03-22
JPS50137079A (en) * 1974-04-17 1975-10-30
JPS5139737A (en) * 1974-10-01 1976-04-02 Canon Kk Hakusotofuyosupinnaa
JPS5114252B1 (en) * 1969-12-29 1976-05-08
JPS5246903A (en) * 1975-10-08 1977-04-14 Mitsubishi Electric Corp Rotary coating apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5114252B1 (en) * 1969-12-29 1976-05-08
JPS4931590A (en) * 1972-07-24 1974-03-22
JPS50137079A (en) * 1974-04-17 1975-10-30
JPS5139737A (en) * 1974-10-01 1976-04-02 Canon Kk Hakusotofuyosupinnaa
JPS5246903A (en) * 1975-10-08 1977-04-14 Mitsubishi Electric Corp Rotary coating apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6176957U (en) * 1984-10-26 1986-05-23
JPS636728U (en) * 1986-06-30 1988-01-18
JPH0325400Y2 (en) * 1986-06-30 1991-06-03
US4788994A (en) * 1986-08-13 1988-12-06 Dainippon Screen Mfg. Co. Wafer holding mechanism
US4941426A (en) * 1987-09-18 1990-07-17 Tokyo Ohka Kogyo Co., Ltd. Thin-film coating apparatus
JPH0328722U (en) * 1989-07-31 1991-03-22
US5209180A (en) * 1991-03-28 1993-05-11 Dainippon Screen Mfg. Co., Ltd. Spin coating apparatus with an upper spin plate cleaning nozzle
JPH0654146U (en) * 1992-05-28 1994-07-22 彰浩 申 Pull-insulator
JPH06177107A (en) * 1992-12-08 1994-06-24 Dainippon Screen Mfg Co Ltd Rotary cleaning equipment for rectangular substrate

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