JPS53144265A - Etching device - Google Patents
Etching deviceInfo
- Publication number
- JPS53144265A JPS53144265A JP5870477A JP5870477A JPS53144265A JP S53144265 A JPS53144265 A JP S53144265A JP 5870477 A JP5870477 A JP 5870477A JP 5870477 A JP5870477 A JP 5870477A JP S53144265 A JPS53144265 A JP S53144265A
- Authority
- JP
- Japan
- Prior art keywords
- etching device
- jig
- etching
- surfacing
- bubbles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To ensure a uniform etching by standing substrate close together to the jig and turning the jig with the bubbles surfacing up from the lower part of the etching tank.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5870477A JPS53144265A (en) | 1977-05-23 | 1977-05-23 | Etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5870477A JPS53144265A (en) | 1977-05-23 | 1977-05-23 | Etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53144265A true JPS53144265A (en) | 1978-12-15 |
Family
ID=13091891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5870477A Pending JPS53144265A (en) | 1977-05-23 | 1977-05-23 | Etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53144265A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5758435U (en) * | 1980-09-19 | 1982-04-06 | ||
JPH0555192A (en) * | 1991-08-27 | 1993-03-05 | Mitsubishi Electric Corp | Surface processing apparatus for thin board substance such as wafer |
US5488964A (en) * | 1991-05-08 | 1996-02-06 | Tokyo Electron Limited | Washing apparatus, and washing method |
US5791357A (en) * | 1996-06-06 | 1998-08-11 | Shin-Etsu Handotai Co., Ltd. | Support jig for thin circular objects |
US5839460A (en) * | 1997-11-13 | 1998-11-24 | Memc Electronic Materials, Inc. | Apparatus for cleaning semiconductor wafers |
US6199563B1 (en) * | 1997-02-21 | 2001-03-13 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
US6273107B1 (en) * | 1997-12-05 | 2001-08-14 | Texas Instruments Incorporated | Positive flow, positive displacement rinse tank |
US6767840B1 (en) | 1997-02-21 | 2004-07-27 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
-
1977
- 1977-05-23 JP JP5870477A patent/JPS53144265A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5758435U (en) * | 1980-09-19 | 1982-04-06 | ||
JPS6327784Y2 (en) * | 1980-09-19 | 1988-07-27 | ||
US5488964A (en) * | 1991-05-08 | 1996-02-06 | Tokyo Electron Limited | Washing apparatus, and washing method |
US5782990A (en) * | 1991-05-08 | 1998-07-21 | Tokyo Electron Limited | Method for washing objects |
US5887604A (en) * | 1991-05-08 | 1999-03-30 | Tokyo Electron Limited | Washing apparatus, and washing method |
JPH0555192A (en) * | 1991-08-27 | 1993-03-05 | Mitsubishi Electric Corp | Surface processing apparatus for thin board substance such as wafer |
US5791357A (en) * | 1996-06-06 | 1998-08-11 | Shin-Etsu Handotai Co., Ltd. | Support jig for thin circular objects |
US6199563B1 (en) * | 1997-02-21 | 2001-03-13 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
US6767840B1 (en) | 1997-02-21 | 2004-07-27 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
US5839460A (en) * | 1997-11-13 | 1998-11-24 | Memc Electronic Materials, Inc. | Apparatus for cleaning semiconductor wafers |
US6273107B1 (en) * | 1997-12-05 | 2001-08-14 | Texas Instruments Incorporated | Positive flow, positive displacement rinse tank |
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