JPS51140574A - Method of cleaning silicon substrate plate - Google Patents
Method of cleaning silicon substrate plateInfo
- Publication number
- JPS51140574A JPS51140574A JP6431675A JP6431675A JPS51140574A JP S51140574 A JPS51140574 A JP S51140574A JP 6431675 A JP6431675 A JP 6431675A JP 6431675 A JP6431675 A JP 6431675A JP S51140574 A JPS51140574 A JP S51140574A
- Authority
- JP
- Japan
- Prior art keywords
- substrate plate
- silicon substrate
- cleaning silicon
- cleaning
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To provide a method of cleaning substrate plate, especially for removing movable ions; contained in the substrate plate without restricting the time for cleaning treatment and causing no deformation of the substrate plate.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6431675A JPS51140574A (en) | 1975-05-30 | 1975-05-30 | Method of cleaning silicon substrate plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6431675A JPS51140574A (en) | 1975-05-30 | 1975-05-30 | Method of cleaning silicon substrate plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51140574A true JPS51140574A (en) | 1976-12-03 |
Family
ID=13254697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6431675A Pending JPS51140574A (en) | 1975-05-30 | 1975-05-30 | Method of cleaning silicon substrate plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51140574A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6139524A (en) * | 1984-07-31 | 1986-02-25 | Toshiba Ceramics Co Ltd | Cleaning device for semiconductor wafer |
JPS6197834U (en) * | 1984-12-04 | 1986-06-23 | ||
JPS6369235A (en) * | 1986-09-10 | 1988-03-29 | Tokuda Seisakusho Ltd | Hot blast generator |
JP2009518834A (en) * | 2005-12-08 | 2009-05-07 | フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー | Substrate dry chemical treatment method and use thereof |
JP2014227311A (en) * | 2013-05-21 | 2014-12-08 | 大陽日酸株式会社 | Substrate reuse method and substrate cleaning apparatus |
-
1975
- 1975-05-30 JP JP6431675A patent/JPS51140574A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6139524A (en) * | 1984-07-31 | 1986-02-25 | Toshiba Ceramics Co Ltd | Cleaning device for semiconductor wafer |
JPS6197834U (en) * | 1984-12-04 | 1986-06-23 | ||
JPH0452992Y2 (en) * | 1984-12-04 | 1992-12-14 | ||
JPS6369235A (en) * | 1986-09-10 | 1988-03-29 | Tokuda Seisakusho Ltd | Hot blast generator |
JP2009518834A (en) * | 2005-12-08 | 2009-05-07 | フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー | Substrate dry chemical treatment method and use thereof |
JP2014227311A (en) * | 2013-05-21 | 2014-12-08 | 大陽日酸株式会社 | Substrate reuse method and substrate cleaning apparatus |
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