JPS6197834U - - Google Patents
Info
- Publication number
- JPS6197834U JPS6197834U JP18418784U JP18418784U JPS6197834U JP S6197834 U JPS6197834 U JP S6197834U JP 18418784 U JP18418784 U JP 18418784U JP 18418784 U JP18418784 U JP 18418784U JP S6197834 U JPS6197834 U JP S6197834U
- Authority
- JP
- Japan
- Prior art keywords
- cooling cover
- transparent cooling
- processing chamber
- ultraviolet lamp
- accommodates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001816 cooling Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案に係る紫外線照射処理装置の正
面図、第２図は同装置の側面図、第３図は第１図
のＡ−Ａ線断面図、第４図は胴部を開いた状態の
同装置の正面図である。
尚、図面中１は紫外線照射処理装置本体、２は
処理チヤンバー、５は胴部、１４は冷却用透明カ
バー、１５は紫外線ランプ、Ｗは半導体ウエハー
である。
Fig. 1 is a front view of the ultraviolet irradiation treatment device according to the present invention, Fig. 2 is a side view of the same device, Fig. 3 is a sectional view taken along line A-A in Fig. 1, and Fig. 4 is an open view of the body. FIG. 3 is a front view of the same device in a state. In the drawing, 1 is a main body of the ultraviolet irradiation processing apparatus, 2 is a processing chamber, 5 is a body, 14 is a transparent cover for cooling, 15 is an ultraviolet lamp, and W is a semiconductor wafer.
Claims (1)
体の一部を構成し左右方向に開閉自在とされ内側
面を反射面とした胴部と、この胴部の内側に配設
される冷却用透明カバーとこれら冷却用透明カバ
ー内に挿入される紫外線ランプとからなることを
特徴とする紫外線照射処理装置。 A cylindrical body that accommodates a processing chamber, a body that forms a part of this body and can be opened and closed in the left and right directions and whose inner surface is a reflective surface, and a transparent cooling cover disposed inside this body. and an ultraviolet lamp inserted into the transparent cooling cover.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984184187U JPH0452992Y2 (en) | 1984-12-04 | 1984-12-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984184187U JPH0452992Y2 (en) | 1984-12-04 | 1984-12-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6197834U true JPS6197834U (en) | 1986-06-23 |
| JPH0452992Y2 JPH0452992Y2 (en) | 1992-12-14 |
Family
ID=30741672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984184187U Expired JPH0452992Y2 (en) | 1984-12-04 | 1984-12-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0452992Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51140574A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Method of cleaning silicon substrate plate |
| JPS5861831A (en) * | 1981-10-07 | 1983-04-13 | Toshiba Electric Equip Corp | Light irradiating device |
| JPS59124124A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1984
- 1984-12-04 JP JP1984184187U patent/JPH0452992Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51140574A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Method of cleaning silicon substrate plate |
| JPS5861831A (en) * | 1981-10-07 | 1983-04-13 | Toshiba Electric Equip Corp | Light irradiating device |
| JPS59124124A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0452992Y2 (en) | 1992-12-14 |