JPS56110933A - Developing method - Google Patents

Developing method

Info

Publication number
JPS56110933A
JPS56110933A JP806680A JP806680A JPS56110933A JP S56110933 A JPS56110933 A JP S56110933A JP 806680 A JP806680 A JP 806680A JP 806680 A JP806680 A JP 806680A JP S56110933 A JPS56110933 A JP S56110933A
Authority
JP
Japan
Prior art keywords
wafer
arm
aspirator
moved
developing solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP806680A
Other languages
Japanese (ja)
Inventor
Wataru Wakamiya
Shigeji Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP806680A priority Critical patent/JPS56110933A/en
Publication of JPS56110933A publication Critical patent/JPS56110933A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spray Control Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To uniformly feed a developer by enabling an aspirator for spraying a developing solvent to be moved on a wafer. CONSTITUTION:Aspirator 1 is attached to one end of arm 5, and arm 5 is enabled to be moved like locus A. By moving arm 5 on wafer 3 while increasing the speed at the central part and decreasing it at the edge part, a developing solvent is fed onto wafer 3. A rinsing liq. is also fed in a similar way.
JP806680A 1980-01-25 1980-01-25 Developing method Pending JPS56110933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP806680A JPS56110933A (en) 1980-01-25 1980-01-25 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP806680A JPS56110933A (en) 1980-01-25 1980-01-25 Developing method

Publications (1)

Publication Number Publication Date
JPS56110933A true JPS56110933A (en) 1981-09-02

Family

ID=11682965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP806680A Pending JPS56110933A (en) 1980-01-25 1980-01-25 Developing method

Country Status (1)

Country Link
JP (1) JPS56110933A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5963726A (en) * 1982-10-05 1984-04-11 Toshiba Corp Device for developing photo resist
JPS5978342A (en) * 1982-10-28 1984-05-07 Fujitsu Ltd Resist film developing method
JPS60179957A (en) * 1984-02-27 1985-09-13 Hitachi Ltd Spin developing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54102123A (en) * 1978-01-27 1979-08-11 Matsushita Electric Ind Co Ltd Developing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54102123A (en) * 1978-01-27 1979-08-11 Matsushita Electric Ind Co Ltd Developing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5963726A (en) * 1982-10-05 1984-04-11 Toshiba Corp Device for developing photo resist
JPS5978342A (en) * 1982-10-28 1984-05-07 Fujitsu Ltd Resist film developing method
JPH0462069B2 (en) * 1982-10-28 1992-10-05 Fujitsu Ltd
JPS60179957A (en) * 1984-02-27 1985-09-13 Hitachi Ltd Spin developing device

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