JPS5564234A - Developing method of resist film - Google Patents

Developing method of resist film

Info

Publication number
JPS5564234A
JPS5564234A JP13704478A JP13704478A JPS5564234A JP S5564234 A JPS5564234 A JP S5564234A JP 13704478 A JP13704478 A JP 13704478A JP 13704478 A JP13704478 A JP 13704478A JP S5564234 A JPS5564234 A JP S5564234A
Authority
JP
Japan
Prior art keywords
substrate
resist film
developing solution
center
sprayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13704478A
Other languages
Japanese (ja)
Inventor
Atsushi Endo
Toshio Yada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13704478A priority Critical patent/JPS5564234A/en
Publication of JPS5564234A publication Critical patent/JPS5564234A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the thickness of the resist film evenly by spraying developing solution through a sprayer while letting the substrate having been coated with the resist film rotate within the substrate plane about the substrate centerline. CONSTITUTION:With a drive motor 6 being held stopped, the substrate 3 having been coated with a resist film 2 is sucked and fixed by means of a vacuum chuck 5 onto a substrate stage 4. At this time, the rotating center of the stage 4 and the center of the substrate 3 are aligned. Next, the substrate 3 is rotated by a motor 6, thence developing solution is spraued from the nozzle 1 of the sprayer which is located above the center of the substrate. At this time, the diameter of the nozzle 1 is so adjusted that the developing solution is sprayed to the entire surface of the substrate 3. Thereafter, rinsing process is immediately started to end the development.
JP13704478A 1978-11-06 1978-11-06 Developing method of resist film Pending JPS5564234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13704478A JPS5564234A (en) 1978-11-06 1978-11-06 Developing method of resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13704478A JPS5564234A (en) 1978-11-06 1978-11-06 Developing method of resist film

Publications (1)

Publication Number Publication Date
JPS5564234A true JPS5564234A (en) 1980-05-14

Family

ID=15189546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13704478A Pending JPS5564234A (en) 1978-11-06 1978-11-06 Developing method of resist film

Country Status (1)

Country Link
JP (1) JPS5564234A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62187680U (en) * 1986-05-20 1987-11-28
US7586581B2 (en) 2004-07-02 2009-09-08 Sharp Kabushiki Kaisha Developing method of photoresist and developing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62187680U (en) * 1986-05-20 1987-11-28
JPH0446860Y2 (en) * 1986-05-20 1992-11-05
US7586581B2 (en) 2004-07-02 2009-09-08 Sharp Kabushiki Kaisha Developing method of photoresist and developing device

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